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A thin-film resistive sensor for measuring atomic hydrogen flux density

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Abstract

An eight-channel thin-film resistive atomic hydrogen (AH) sensor is described. It is intended to measure the AH flux density in an atomic-molecular mixture at a reduced gas pressure (10−2–10−4 Pa), particularly under the action of infrared and visible radiation noise, in a computer-aided mode. The sensor can be used for measuring a distribution of the AH flux density of the large cross-section beam. The range of AH flux density measurements is 5 × 1013 − 1016 atoms/(cm2 s), the measurement time is 1–10 min, and the measurement error is 10%. The sensitive element of the sensor is made using planar technology, which offers a chance to attain a high resolution in spatial distribution mesurements.

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Authors and Affiliations

  1. Research Institute of Semiconductor Devices, ul. Krasnoarmeiskaya 99A, Tomsk, 634034, Russia

    V. A. Kagadei

  2. Institute of High-Current Electronics, Siberian Branch, Russian Academy of Sciences, pr. Akademicheskii 2/3, Tomsk, 634055, Russia

    E. V. Nefedtsev, D. I. Proskurovskii, S. V. Romanenko & V. V. Chupin

Authors
  1. V. A. Kagadei
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  2. E. V. Nefedtsev
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  3. D. I. Proskurovskii
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  4. S. V. Romanenko
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  5. V. V. Chupin
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Original Russian Text © V.A. Kagadei, E.V. Nefedtsev, D.I. Proskurovskii, S.V. Romanenko, V.V. Chupin, 2008, published in Pribory i Tekhnika Eksperimenta, 2008, No. 1, pp. 155–159.

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Kagadei, V.A., Nefedtsev, E.V., Proskurovskii, D.I. et al. A thin-film resistive sensor for measuring atomic hydrogen flux density. Instrum Exp Tech 51, 142–146 (2008). https://doi.org/10.1134/S0020441208010193

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  • DOI: https://doi.org/10.1134/S0020441208010193

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