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Thermal Stability Limit of Thin Palladium(II) Oxide Films

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Abstract—

X-ray diffraction and scanning electron microscopy data demonstrate that the thermal stability limit of thin PdO films in an oxygen atmosphere rises from 1083 ± 5 to 1133 ± 5 K as the thickness of the starting Pd layers increases from ~10 to ~95 nm, respectively. Unlike the continuous starting metallic palladium layers, the Pd nanostructures resulting from complete thermal decomposition of thin PdO films consist of isolated hemispheric nanocrystallites having well-defined faceting. According to the X-ray diffraction results, the Pd crystallites have (111) and (100) preferential alignment.

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Funding

This work was supported by the Russian Federation Ministry of Science and Higher Education as part of the state research target for the higher education institutions in 2020–2022, project no. FZGU-2020-0036.

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Authors and Affiliations

  1. Voronezh State University, 394018, Voronezh, Russia

    A. M. Samoylov, D. I. Pelipenko, S. A. Ivkov & E. S. Tyulyakova

  2. Research Institute of Electronic Engineering, 394033, Voronezh, Russia

    B. L. Agapov

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  1. A. M. Samoylov
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  2. D. I. Pelipenko
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  3. S. A. Ivkov
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  4. E. S. Tyulyakova
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Correspondence to A. M. Samoylov.

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Translated by O. Tsarev

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Samoylov, A.M., Pelipenko, D.I., Ivkov, S.A. et al. Thermal Stability Limit of Thin Palladium(II) Oxide Films. Inorg Mater 58, 48–55 (2022). https://doi.org/10.1134/S0020168522010095

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  • DOI: https://doi.org/10.1134/S0020168522010095

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