Abstract—
Barium strontium niobate films have been grown on MgO(001) substrates by single-step rf cathode sputtering of a ceramic target with the stoichiometric composition Sr0.5Ba0.5Nb2O6 in an oxygen atmosphere under various conditions (at different substrate biases). It has been shown that, depending on its polarity, the substrate bias either increases or reduces the flux of structure-forming elements to the substrate and, as a consequence, changes the growth rate, without impairing the surface morphology or surface perfection of the film or producing impurity phases. The mechanisms underlying the observed general relationships are discussed.
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ACKNOWLEDGMENTS
In this study, we used equipment at the Electromagnetic, Electromechanical, and Thermal Properties of Solids Shared Research Facilities Center, Research Institute of Physics, Southern Federal University, and at the Joint Scientific and Technological Equipment Center (Shared Research Facilities Center), Southern Scientific Center, Russian Academy of Sciences (research, development, and evaluation).
Funding
This work was supported by the Russian Federation Ministry of Science and Higher Education (state research target for the Southern Scientific Center, Russian Academy of Sciences, state registration no. 01201354247).
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Translated by O. Tsarev
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Pavlenko, A.V., Zinchenko, S.P., Stryukov, D.V. et al. Effect of Substrate Bias on the Crystal Structure and Morphology of Barium Strontium Niobate Films Grown by RF Cathode Sputtering. Inorg Mater 57, 377–382 (2021). https://doi.org/10.1134/S0020168521040117
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DOI: https://doi.org/10.1134/S0020168521040117