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Hydrogenated microcrystalline silicon for solar cells

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Inorganic Materials Aims and scope

Abstract

We report a detailed study of the deposition, composition, structure, and photoelectric properties of low-temperature microcrystalline silicon layers produced by a novel method, which takes advantage of the activation of gas mixtures in an electron-beam plasma and the transport of the activated particles to the deposition zone at a supersonic speed. Under optimal conditions, we have reached deposition rates above 5 nm/s on substrates 150 × 150 mm in dimensions. The method under development is potentially attractive for the fabrication of thin-film solar cells through roll-to-roll processing on cheap substrates.

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Authors and Affiliations

  1. Kutateladze Institute of Thermal Physics, Siberian Branch, Russian Academy of Sciences, pr. Akademika Lavrent’eva 1, Novosibirsk, 630090, Russia

    R. G. Sharafutdinov & V. G. Shchukin

  2. Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences, pr. Akademika Lavrent’eva 13, Novosibirsk, 630090, Russia

    O. I. Semenova

Authors
  1. R. G. Sharafutdinov
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  2. V. G. Shchukin
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  3. O. I. Semenova
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Correspondence to O. I. Semenova.

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Original Russian Text © R.G. Sharafutdinov, V.G. Shchukin, O.I. Semenova, 2012, published in Neorganicheskie Materialy, 2012, Vol. 48, No. 5, pp. 523–529.

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Sharafutdinov, R.G., Shchukin, V.G. & Semenova, O.I. Hydrogenated microcrystalline silicon for solar cells. Inorg Mater 48, 445–450 (2012). https://doi.org/10.1134/S0020168512050172

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  • DOI: https://doi.org/10.1134/S0020168512050172

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