Abstract
Niobium oxide films have been grown by reactive rf sputtering in a vacuum system and characterized by absorption spectroscopy and X-ray diffraction. The thickness of the (optically transparent) films has been determined as a function of sputtering time by examining interference effects in a plane-parallel layer. The average deposition rate is determined to be 7.4 ± 0.3 Å/min (95% confidence interval).
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Original Russian Text © S.V. Zaitsev, Yu.V. Gerasimenko, S.N. Saltykov, D.A. Khoviv, A.M. Khoviv, 2011, published in Neorganicheskie Materialy, 2011, Vol. 47, No. 4, pp. 468–472.
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Zaitsev, S.V., Gerasimenko, Y.V., Saltykov, S.N. et al. Growth of ultrathin Nb2O5 films on quartz substrates. Inorg Mater 47, 412–416 (2011). https://doi.org/10.1134/S0020168511040224
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DOI: https://doi.org/10.1134/S0020168511040224