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Growth of ultrathin Nb2O5 films on quartz substrates

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Abstract

Niobium oxide films have been grown by reactive rf sputtering in a vacuum system and characterized by absorption spectroscopy and X-ray diffraction. The thickness of the (optically transparent) films has been determined as a function of sputtering time by examining interference effects in a plane-parallel layer. The average deposition rate is determined to be 7.4 ± 0.3 Å/min (95% confidence interval).

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References

  1. Hallbauer, A., Huber, D., Klauser, F., et al., Optical and Structural Characteristics of Ion-Plated Nb2O5 and HfO2 Films, Plasma Process. Polym., 2007, vol. 4, pp. S53–S58.

    Article  Google Scholar 

  2. Wachs, I.E., Recent Conceptual Advances in the Catalysis Science of Mixed Metal Oxide Catalytic Materials, Catal. Today, 2005, vol. 100, pp. 79–94.

    Article  CAS  Google Scholar 

  3. Starr, D.E., Mendes, F.M.T., Middeke, J., et al., Preparation and Characterization of Well-Ordered, Thin Niobia Films on a Metal Substrate, Surf. Sci., 2005, vol. 599, pp. 14–26.

    Article  CAS  Google Scholar 

  4. Filho, D. de A.B., Franco, D.W., Filho, P.P.A., and Alves, O.L., Niobia Films: Surface Morphology, Surface Analysis, Photoelectrochemical Properties and Crystallization Process, J. Mater. Sci., 1998, vol. 33, pp. 2607–2616.

    Article  Google Scholar 

  5. Avellaneda, C.O., Pawlicka, A., and Aegerter, M.A., Two Methods of Obtaining Sol-Gel Nb2O5 Thin Films for Electrochromic Devices, J. Mater. Sci., 1998, vol. 33, pp. 2181–2185.

    Article  CAS  Google Scholar 

  6. Pawlicka, A., Atik, M., and Aegerter, M.A., Synthesis of Multicolor Coatings for Electrochromic Devices, Thin Solid Films, 1997, vol. 301, nos. 1–2, pp. 236–241.

    Article  CAS  Google Scholar 

  7. Da Costa, E., Avellaneda, C.O., and Pawlicka, A., Alternative Nb2O5-TiO2 Thin Films for Electrochromic Devices, J. Mater. Sci., 2001, vol. 36, pp. 1407–1410.

    Article  Google Scholar 

  8. De Sá, A.I., Rangel, C.M., Skeldon, P., and Thompson, G.E., Semiconductive Properties of Anodic Niobium Oxides, Port. Electrochim. Acta, 2006, vol. 24, pp. 305–311.

    Article  Google Scholar 

  9. Logacheva, V.A., Divakova, N.A., Tikhonova, Yu.A., et al., Growth of Niobium Oxide Films on Single-Crystal Silicon, Neorg. Mater., 2007, vol. 43, no. 11, pp. 1366–1371 [Inorg. Mater. (Engl. Transl.), vol. 43, no. 11, pp. 1230–1234].

    Article  Google Scholar 

  10. Nagibina, N.B., Interferentsiya i difraktsiya sveta (Interference and Diffraction of Light), Leningrad: Mashinostroenie, 1985.

    Google Scholar 

  11. Sullivan, B.T., Clarke, G.A., Akiyama, T., et al., High-Rate Automated Deposition System for the Manufacture of Complex Multilayer Coatings, Appl. Opt., 2000, vol. 39, no. 1, pp. 157–167.

    Article  CAS  Google Scholar 

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Correspondence to S. V. Zaitsev.

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Original Russian Text © S.V. Zaitsev, Yu.V. Gerasimenko, S.N. Saltykov, D.A. Khoviv, A.M. Khoviv, 2011, published in Neorganicheskie Materialy, 2011, Vol. 47, No. 4, pp. 468–472.

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Zaitsev, S.V., Gerasimenko, Y.V., Saltykov, S.N. et al. Growth of ultrathin Nb2O5 films on quartz substrates. Inorg Mater 47, 412–416 (2011). https://doi.org/10.1134/S0020168511040224

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  • DOI: https://doi.org/10.1134/S0020168511040224

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