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Organosilicon-Based Hybrid Materials Produced Using Low Temperature Plasma

  • PLASMA CHEMISTRY
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Abstract

Published data on the effect of low-temperature plasma on polydimethylsiloxane have been analyzed. Changes in the contact properties, chemical structure, and morphology of the modified polymer surface have been revealed using modern research techniques (contact angle measurement, X-ray photoelectron spectroscopy, Fourier-transform IR spectroscopy, atomic force and scanning electron microscopy). It has been shown that modification by plasma results in the formation of a hybrid material that has the surface layer consisting mainly of silicon oxide. Plasma-enhanced chemical vapor deposition processes of hexamethyldisiloxane polymerization on various substrates are considered and the formation of similar hybrid materials containing a significant amount of silicon oxide is shown. Data on the use of such materials in biology, medicine, membranes, humidity sensors, and other fields of science and technology are presented.

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ACKNOWLEDGMENTS

The authors are grateful to Academician A.M. Muzafarov for the idea of writing this paper.

Funding

This work was supported by the Ministry of Science and Education of the Russian Federation, subject number FFSM-2021-0006, and the Russian Foundation for Basic Research, project no. 20-08-00655.

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Authors and Affiliations

  1. Enikolopov Institute of Synthetic Polymer Materials, Russian Academy of Sciences, 117393, Moscow, Russia

    A. B. Gilman, A. V. Zinoviev & A. A. Kuznetsov

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  1. A. B. Gilman
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  2. A. V. Zinoviev
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  3. A. A. Kuznetsov
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Correspondence to A. B. Gilman or A. V. Zinoviev.

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Translated by S. Zatonsky

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Gilman, A.B., Zinoviev, A.V. & Kuznetsov, A.A. Organosilicon-Based Hybrid Materials Produced Using Low Temperature Plasma. High Energy Chem 56, 468–476 (2022). https://doi.org/10.1134/S0018143922060078

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  • DOI: https://doi.org/10.1134/S0018143922060078

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