Abstract
An investigation of the processes on a Si(100) surface interacting with oxygen near the solid-oxide nucleation threshold using x-ray photoelectron spectroscopy and atomic-force microscopy is described. The nucleation threshold is the boundary between the temperature and oxygen pressure regions where a phase transition with the formation of a submonolayer oxide and a roughening transition caused by oxygen adsorption occur. Near the nucleation threshold, either a random rough relief or a quasiperiodic structure is formed on a surface coated with chemisorbed oxygen. The formation of the rough relief due to oxygen adsorption has been interpreted within the theory of phase transitions as a result of vacancy clustering. A model that allows one to describe the dynamics of processes on the surface near the nucleation threshold in qualitative and in some cases in quantitative terms has been suggested.
Similar content being viewed by others
References
K. Wurm, R. Kliese, Y. Hong et al., Phys. Rev. B 50, 1567 (1994).
J. V. Seiple and J. P. Pelz, Phys. Rev. Lett. 73, 999 (1994).
A. Feltz, U. Memmert, and R. J. Behm, Surf. Sci. 314, 34 (1994).
Y. Ono, M. Tabe, and H. Kageshina, Phys. Rev. B 48, 14 291 (1993).
N. C. Lu, E. P. Gusev, E. Garfunkel et al., Surf. Sci. Technol. 10, 215 (1995).
T. Engel, Surf. Sci. Rep. 18, 94 (1993).
Y. Enta, Y. Takegawa, T. Suemitsi et al., Appl. Surf. Sci. 100/101, 449 (1996).
C. J. Sofield and A. M. Stoneham, Semicond. Sci. Technol. 10, 215 (1995).
M. Niwa, T. Kouzaki, M. Udagawa et al., Jpn. J. Appl. Phys. 33, 388 (1994).
Fundamental Aspects of Ultrathin Dielectrics on Si-Based Devices: Towards Atomic-Scale Understanding (Technical Program and Abstracts, Advance Research Workshop Supported by NATO Science Affairs Division), St. Petersburg, Russia (1997).
F. Lutz, L. Kubler, and J. L. Bischoff, Phys. Rev. B 40, 11 747 (1989).
V. D. Borman, E. P. Gusev, Yu. Yu. Lebedinski, and V. I. Troyan, Phys. Rev. B 49, 5415 (1994).
G. Hollinger and F. J. Himpsel, Phys. Rev. B 28, 3651 (1983).
F. J. Himpsel, F. R. McFeely, A. Taleb-Ibrahimi et al., Phys. Rev. B 38, 6084 (1988).
J. R. Engstrom, D. J. Bonser, and T. Engel, Surf. Sci. 268, 238 (1992).
V. D. Borman, E. P. Gusev, Yu. N. Devyatko et al., Poverkhnost’ 8, 22 (1990).
Ph. Avouris and D. Cahill, Ultramicroscopy 42–44, 838 (1992).
Ph. Avouris, In-Whan Lyo, and F. Bozso, J. Vac. Sci. Technol. B 9, 424 (1991).
K. Ohkubo, Y. Igari, S. Tomoda et al., Surf. Sci. 260, 44 (1992).
V. D. Borman, E. P. Gusev, Yu. N. Devyatko, V. N. Tronin, and V. I. Troyan, Surf. Sci. Lett. 301, L239 (1994).
Yu. N. Devyatko and V. N. Tronin, Phys. Scr. 41, 355 (1990).
F. M. Ross, J. M. Gibson, and R. D. Twesten, Surf. Sci. 310, 243 (1994).
V. D. Borman, O. V. Tapinskaya, V. N. Tronin, and V. I. Troyan, Phys. Low-Dimens. Struct. 6, 7 (1994).
V. D. Borman, O. V. Tapinskaya, V. N. Tronin, and V. I. Troyan, JETP Lett. 60, 718 (1994).
F. Lutz, J. L. Bischoff, L. Kubler, and D. Bolmont, Phys. Rev. B 40, 10 356 (1989).
M. Tabe, T. T. Chiang, I. Lindau, and W. E. Spicer, Phys. Rev. B 34, 2706 (1986).
H. Ibach, H. D. Bruchmann, and H. Wagner, Appl. Phys. A 29, 113 (1982).
P. J. Grunthaner, M. H. Hecht, F. J. Grunthaner, and N. M. Johnson, J. Appl. Phys. 61, 629 (1987).
G. Hollinger, J. F. Morar, F. J. Himpsel et al., Surf. Sci. 168, 609 (1986).
J. J. Lander and J. Morrison, J. Appl. Phys. 33, 2089 (1962).
F. W. Smith and G. Ghidini, J. Electrochem. Soc. 129, 1300 (1982).
M. P. D’Evelyn, M. M. Nelson, and T. Engel, Surf. Sci. 186, 75 (1987).
F. M. Leibsle, A. Samsavar, and T. C. Chiang, Phys. Rev. B 38, 5780 (1988).
P. Gupta, C. H. Mak, P. A. Coon, and S. M. George, Phys. Rev. B 40, 7739 (1989).
Ya. E. Geguzin and Yu. S. Kaganovskii, Diffusion Processes on Crystal Surfaces [in Russian], Énergoatomizdat, Moscow (1984).
A. Pimpinelli and J. Villain, Physica A 204, 521 (1994).
V. S. Vavilov, V. F. Kiselev, and V. N. Mukashev, Defects in Silicon and on its Surface [in Russian], Nauka, Moscow (1990).
A. N. Tikhonov and A. A. Samarskii, Equations of Mathematical Physics [in Russian], Nauka, Moscow (1977).
L. D. Landau and E. M. Lifshitz, Statistical Physics, Pergamon Press, Oxford-New York (1980).
Yu. N. Devyatko and V. N. Tronin, Zh. Éksp. Teor. Fiz. 98, 1570 (1990) [Sov. Phys. JETP 71, 880 (1990)].
V. P. Skripov and A. V. Skripov, Usp. Fiz. Nauk 128, 193 (1979) [Sov. Phys. Usp. 22, 389 (1979)].
Author information
Authors and Affiliations
Additional information
Zh. Éksp. Teor. Fiz. 114, 239–262 (July 1998)
Rights and permissions
About this article
Cite this article
Borman, V.D., Lebedinskii, Y.Y. & Troyan, V.I. Roughening of a Si(100) surface induced by the adsorption of oxygen near the solid-oxide nucleation threshold. J. Exp. Theor. Phys. 87, 133–145 (1998). https://doi.org/10.1134/1.558634
Received:
Issue Date:
DOI: https://doi.org/10.1134/1.558634