Abstract
Photoluminescence in the 1.2–1.4 eV spectral range from GaN:As layers grown on (0001) Al2O3 substrates was observed and studied. The photoluminescence is attributed to radiative recombination in GaAs nanocrystallites, self-organized in the GaN matrix during growth. The photoluminescence intensity attains a maximum at a growth temperature of ∼780°C, which is explained by the competition between several temperature-dependent processes that affect the formation of GaAs nanocrystallites. Sharp emission lines were observed at the high-energy edge of the photoluminescence band. These lines are caused by an emission of bound excitons in the GaAs nanocrystallites and by phonon replicas of the bound-exciton emission. The energies of the corresponding optical phonons are typical of GaAs. The photoluminescence-excitation spectra exhibit features related to resonantly excited free and bound excitons as well as to excitons formed simultaneously with the emission of optical phonons.
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Translated from Fizika i Tekhnika Poluprovodnikov, Vol. 39, No. 1, 2005, pp. 82–86.
Original Russian Text Copyright © 2005 by Andrianov, Novikov, Zhuravlev, Li, Xia, Bull, Harrison, Larkins, Foxon.
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Andrianov, A.V., Novikov, S.V., Zhuravlev, I.S. et al. Efficient near IR photoluminescence from gallium nitride layers doped with arsenic. Semiconductors 39, 73–76 (2005). https://doi.org/10.1134/1.1852649
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DOI: https://doi.org/10.1134/1.1852649