Abstract
The experimental technology and characteristics of domestic AlGaN/GaN high electron mobility transistors are described. The results show good prospects for further development.
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RF Pat. Appl. No. 2003109501/28(010201) (Accepted 2003).
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Translated from Pis’ma v Zhurnal Tekhnichesko\(\overset{\lower0.5em\hbox{$\smash{\scriptscriptstyle\smile}$}}{l} \) Fiziki, Vol. 30, No. 9, 2004, pp. 63–67.
Original Russian Text Copyright © 2004 by Volkov, Ivanova, Kuz’michev, Lermontov, Solov’ev, Baranov, Ka\(\overset{\lower0.5em\hbox{$\smash{\scriptscriptstyle\smile}$}}{l} \)dash, Krasovitski\(\overset{\lower0.5em\hbox{$\smash{\scriptscriptstyle\smile}$}}{l} \), Pavlenko, Petrov, Pogorel’ski\(\overset{\lower0.5em\hbox{$\smash{\scriptscriptstyle\smile}$}}{l} \), I. Sokolov, M. Sokolov, Stepanov, Chaly\(\overset{\lower0.5em\hbox{$\smash{\scriptscriptstyle\smile}$}}{l} \).
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Volkov, V.V., Ivanova, V.P., Kuz’michev, Y.S. et al. AlGaN/GaN HEMTs grown by ammonia MBE. Tech. Phys. Lett. 30, 380–382 (2004). https://doi.org/10.1134/1.1760861
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DOI: https://doi.org/10.1134/1.1760861