Abstract
The structure of the conduction band bottom of polycrystalline and recrystallized n-InSb films grown on silicon dioxide substrates has been studied by measuring the temperature dependence of the electrical conductivity in the intrinsic conductivity range. Linear dependences lnσ=f(103/T) with different slopes can be observed in heterogeneous semiconductors in the intrinsic conductivity range. The percolation level has been determined from the average of ΔE 1, ΔE 2, ..., ΔE n to be 0.165 eV for polycrystalline and 0.2 eV for recrystallized films.
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Translated from Fizika i Tekhnika Poluprovodnikov, Vol. 35, No. 11, 2001, pp. 1309–1310.
Original Russian Text Copyright © 2001 by Nikol’ski\(\overset{\lower0.5em\hbox{$\smash{\scriptscriptstyle\smile}$}}{l} \).
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Nikol’skii, Y.A. On the charge transport mechanism in n-InSb films. Semiconductors 35, 1252–1253 (2001). https://doi.org/10.1134/1.1418066
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DOI: https://doi.org/10.1134/1.1418066