Abstract
It is found that two types of centers are formed in Si1−x Gex single crystals as a result of irradiation with fast electrons: divacancies (V 2) characteristic of silicon and the V *2 centers; the latter are complexes of divacancies V 2 with germanium atoms (V 2Ge). It is shown that an absorption band peaked at about 5560 cm−1 is a superposition of two absorption bands that correspond to the above centers. The V 2 divacancies diffuse during isochronous heat treatment and interact with germanium atoms, thus giving rise to additional V *2 centers. The latter have a higher thermal stability than the V 2 centers do, and their annealing temperature increases with increasing content of germanium.
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Translated from Fizika i Tekhnika Poluprovodnikov, Vol. 35, No. 8, 2001, pp. 927–931.
Original Russian Text Copyright © 2001 by Pomozov, Sosnin, Khirunenko, Abrosimov, Schröder.
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Pomozov, Y.V., Sosnin, M.G., Khirunenko, L.I. et al. Origin of an absorption band peaked at 5560 cm−1 and related to divacancies in Si1−x Gex . Semiconductors 35, 890–894 (2001). https://doi.org/10.1134/1.1393022
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DOI: https://doi.org/10.1134/1.1393022