Abstract
Epitaxial n-PbTe layers were grown on BaF2 {111} single-crystal substrates by hot-wall epitaxy from the gaseous phase. These layers were kept in atmospheric air for 15–30 days, after which In and protective BaF2 layers were deposited. Current-voltage characteristics and photoelectric sensitivity spectra of the In/n-PbTe barrier structures were measured in the temperature range T=80–300 K. Based on the experimental results, a model of charge transport is suggested and the effective barrier height ϕ effb , the insulator layer thickness δ, and the surface-state density D S are determined.
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Translated from Fizika i Tekhnika Poluprovodnikov, Vol. 34, No. 12, 2000, pp. 1420–1425.
Original Russian Text Copyright © 2000 by Aleksandrova, Akhmedzhanov, Bondokov, Moshnikov, Saunin, Tairov, Shtanov, Yashina.
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Aleksandrova, O.A., Akhmedzhanov, A.T., Bondokov, R.T. et al. The In/PbTe barrier structures with a thin intermediate insulating layer. Semiconductors 34, 1365–1369 (2000). https://doi.org/10.1134/1.1331792
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DOI: https://doi.org/10.1134/1.1331792