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A new method of layer deposition

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Abstract

A new approach to layer-by-layer film deposition is developed based on the data of molecular dynamics modeling. The proposed deposition method makes use of a nonlinear pulse interaction with a free material (source) surface. It is shown that, provided the pulse amplitude is sufficiently large, an atomic plane is detached from the surface. Impinging on a target (substrate), the detached plane forms a monolayer coating. Combining various source materials, it is possible to obtain multilayer films with complicated compositions and structures.

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Authors and Affiliations

  1. Institute of Strength Physics and Materials Science, Siberian Division, Russian Academy of Sciences, Tomsk, 634055, Russia

    S. G. Psakh’e, K. P. Zol’nikov & T. Yu. Uvarov

Authors
  1. S. G. Psakh’e
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  2. K. P. Zol’nikov
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  3. T. Yu. Uvarov
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Translated from Pis’ma v Zhurnal Tekhnichesko\(\overset{\lower0.5em\hbox{$\smash{\scriptscriptstyle\smile}$}}{l}\) Fiziki, Vol. 26, No. 19, 2000, pp. 6–9.

Original Russian Text Copyright © 2000 by Psakh’e, Zol’nikov, Uvarov.

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Psakh’e, S.G., Zol’nikov, K.P. & Uvarov, T.Y. A new method of layer deposition. Tech. Phys. Lett. 26, 851–853 (2000). https://doi.org/10.1134/1.1321217

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  • DOI: https://doi.org/10.1134/1.1321217

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