Abstract
Conditions for the growth of single-crystalline GaAs, AlGaAs, and InGaAs layers by metalorganic VPE were established and the corresponding semiconductor films were obtained on porous GaAs substrates. Comparative data on the morphology, structure, and electrical homogeneity of the epitaxial layers grown on the porous and monolithic substrates are presented. It was found that passage to the porous substrates leads to changes in the film growth rate and morphology, the concentration of electrically active defects, and their distribution in depth of the epitaxial structures.
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Translated from Pis’ma v Zhurnal Tekhnichesko\(\overset{\lower0.5em\hbox{$\smash{\scriptscriptstyle\smile}$}}{l} \) Fiziki, Vol. 26, No. 7, 2000, pp. 64–69.
Original Russian Text Copyright © 2000 by Buzynin, Gusev, Danil’tsev, Drozdov, Drozdov, Murel’, Khrykin, Shashkin.
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Buzynin, Y.N., Gusev, S.A., Danil’tsev, V.M. et al. Single-crystalline GaAs, AlGaAs, and InGaAs layers grown by metalorganic VPE on porous GaAs substrates. Tech. Phys. Lett. 26, 298–301 (2000). https://doi.org/10.1134/1.1262823
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DOI: https://doi.org/10.1134/1.1262823