Abstract—In our work, we carry out a structural-spectroscopic study of AlGaN/GaN epitaxial layers grown by molecular-beam epitaxy with nitrogen-plasma activation on a hybrid substrate containing layers of silicon carbide and porous silicon. Using X-ray diffractometry, Raman and photoluminescence spectroscopy, it is shown that thin films formed on a hybrid substrate have minimal residual stresses and intense photoluminescence.
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ACKNOWLEDGMENTS
X-ray studies were performed using the equipment of the resource center “X-ray diffraction methods of research” of St. Petersburg State University.
Funding
This work was supported by the Russian Science Foundation (grant no. 19-72-10007).
The work was partly supported by the Ministry of Education and Science of the Russian Federation (grant no. FZGU-2020-0036 and no. FSRM-2020-0008).
Concerning access to scientific equipment and the methodology, this study was supported by the Ministry of Science and Higher Education of Russia under Agreement N 075-15-2021-1351.
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Seredin, P.V., Radam, A.O., Goloshchapov, D.L. et al. On the Growth of Thin-Film AlGaN/GaN Epitaxial Heterostructures on Hybrid Substrates Containing Layers of Silicon Carbide and Porous Silicon. Semiconductors 56, 253–258 (2022). https://doi.org/10.1134/S1063782622040030
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DOI: https://doi.org/10.1134/S1063782622040030