Abstract
It is shown that short-term exposure of thin-film electroluminescent structures based on ZnS:Mn films to ultraviolet pulses with energy much lower than the threshold energies for laser annealing of ZnS:Mn films can enhance the brightness and efficiency of the electroluminescence, increase the slope of the brightness-voltage characteristics, improve the operating stability, and increase the electrical safety margin of the structures. It is established that the improvement in the properties of structures is caused by the photostimulation of below-threshold defect annealing processes and impurity diffusion, which lead to redistribution of the Mn ions in the ZnS film and reduce the concentration of shallow states which influence the structural characteristics.
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Pis’ma Zh. Tekh. Fiz. 24, 1–6 (February 26, 1998)
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Kononets, Y.F. Enhancement of the characteristics of thin-film electromluminescent structures based on ZnS:Mn films after low-power laser irradiation. Tech. Phys. Lett. 24, 124–126 (1998). https://doi.org/10.1134/1.1262020
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DOI: https://doi.org/10.1134/1.1262020