Abstract
The morphology of layers obtained by anodic etching is related to the current-voltage characteristics of the electrolytic cell during the etching. By etching at various points of the current-voltage characteristic one can obtain porous silicon with various structures.
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References
R. L. Smith and S. D. Collins, J. Appl. Phys. 71, R1 (1992).
G. Bomchil and R. Herino, L’Echo Recherches 131, 25 (1988).
V. Lehmann and H. Foll, J. Electrochem. Soc. 137, 653 (1990).
Y. Arita and Y. Sunohara, J. Electrochem. Soc. 124, 285 (1977).
S. O. Izidinov, A. P. Blokhina, and L. A. Ismailova Fiz. Khim. Obrab. Mater. 2, 92 (1987).
É. Yu. Buchin, A. V. Postnikov, A. V. Prokaznikov, V. B. Svetovoi, and A. B. Churilov, Pis’ma Zh. Tekh. Fiz. 21(1), 60 (1995) [Tech. Phys. Lett. 21, 27 (1995)].
E. Yu. Buchin, A. B. Churilov, A. V. Postnikov, A. V. Prokaznikov, and V. B. Svetovoy, Phys. Low Dim. Str. 2/3, 97 (1995).
E. Yu. Buchin, A. B. Churilov, and A. V. Prokaznikov, Appl. Surf. Sci. 102, 431 (1996).
V. A. Myamlin and Yu. V. Pleskov, Electrochemistry of Semiconductors [in Russian] (Nauka, Moscow, 1965).
Yu. Ya. Gurevich and Yu. V. Pleskov, Photoelectrochemistry of Semiconductors [in Russian] (Nauka, Moscow, 1983).
V. Lehmann, J. Electrochem. Soc. 140, 2836 (1993).
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Pis’ma Zh. Tekh. Fiz. 23, 80–84 (March 26, 1997)
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Buchin, É.Y., Prokaznikov, A.V. Control of the morphology of n-type porous silicon. Tech. Phys. Lett. 23, 244–245 (1997). https://doi.org/10.1134/1.1261644
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DOI: https://doi.org/10.1134/1.1261644