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Effect of nanocrystalline inclusions on the photosensitivity of amorphous hydrogenated silicon films

  • Amorphous, Vitreous, and Porous Semiconductors
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Abstract

Photosensitivity of amorphous hydrogenated silicon films containing inclusions of Si nanocrystals, along with spectral characteristics of photoconductivity, were studied. A correlation between photosensitivity and features of the Raman spectra was established. The highest photosensitivity is observed in films with medium-range order formed to the maximum extent.

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Authors and Affiliations

  1. Ioffe Physicotechnical Institute, Russian Academy of Sciences, Politekhnicheskaya ul. 26, St. Petersburg, 194021, Russia

    O. A. Golikova & M. M. Kazanin

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  1. O. A. Golikova
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  2. M. M. Kazanin
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__________

Translated from Fizika i Tekhnika Poluprovodnikov, Vol. 34, No. 6, 2000, pp. 762–765.

Original Russian Text Copyright © 2000 by Golikova, Kazanin.

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Golikova, O.A., Kazanin, M.M. Effect of nanocrystalline inclusions on the photosensitivity of amorphous hydrogenated silicon films. Semiconductors 34, 737–740 (2000). https://doi.org/10.1134/1.1188064

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  • DOI: https://doi.org/10.1134/1.1188064

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