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Distinctive features of molecular-beam epitaxial growth of silicon on Si (100) surfaces in the presence of arsenic

  • Atomic Structure and Non-Electronic Properties of Semiconductors
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Abstract

The authors of this paper discuss their studies of the influence of background arsenic pressure on the properties of autoepitaxial layers of silicon grown on Si (100) surfaces by molecular-beam epitaxy. In these investigations the following experimental techniques were used: reflection high-energy electron diffraction (RHEED), scanning tunneling microscopy, x-ray photoelectron spectroscopy, and secondary ion mass spectrometry.

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Fiz. Tekh. Poluprovodn. 33, 1158–1163 (October 1999)

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Tsirlin, G.É., Petrov, V.N., Polyakov, N.K. et al. Distinctive features of molecular-beam epitaxial growth of silicon on Si (100) surfaces in the presence of arsenic. Semiconductors 33, 1054–1058 (1999). https://doi.org/10.1134/1.1187863

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  • DOI: https://doi.org/10.1134/1.1187863

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