Abstract
The authors of this paper discuss their studies of the influence of background arsenic pressure on the properties of autoepitaxial layers of silicon grown on Si (100) surfaces by molecular-beam epitaxy. In these investigations the following experimental techniques were used: reflection high-energy electron diffraction (RHEED), scanning tunneling microscopy, x-ray photoelectron spectroscopy, and secondary ion mass spectrometry.
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G. Franzo, F. Priolo, S. Coffa, A. Polman, and A. Carnera, Appl. Phys. Lett. 64, 2235 (1994).
K. Eberl, K. Brunner, and W. Winter, Thin Solid Films 249, 98 (1997).
A. G. Gullis, L. T. Canha, and P. D. J. Calcott, J. Appl. Phys. 82, 909 (1997).
G. E. Tsyrlin, V. N. Petrov, V. G. Dubrovskii, S. A. Masalov, A. O. Golubok, N. I. Komyak, N. N. Ledentsov, Zh. I. Alferov, and D. Bimberg, Pis’ma Zh. Tekh. Fiz. Lett. 24(8), 13 (1998) [Tech. Phys. Lett. 24, 628 (1998)].
G. E. Cirlin, V. G. Dubrovskii, V. N. Petrov, N. K. Polyakov, N. P. Korneeva, V. N. Demidov, A. O. Golubok, S. A. Masalov, D. V. Kurochkin, O. M. Gorbenko, N. I. Komyak, V. M. Ustinov, A. Yu. Egorov, A. R. Kovsh, M. V. Maximov, A. F. Tsatsul’nikov, B. V. Volovik, A. E. Zhukov, P. S. Kop’ev, Zh. I. Alferov, N. N. Ledentsov, M. Grundmann, and D. Bimberg, Semicond. Sci. Technol. 13, 1262 (1998).
N. N. Ledentsov, V. M. Ustinov, V. A. Shchukin, P. S. Kop’ev, Zh. I. Alferov, and D. Bimberg, Fiz. Tekh. Poluprovodn. 32, 385 (1998) [Semiconductors 32, 343 (1998)].
A. F. Tsatsul’nikov, A. Yu. Egorov, P. S. Kop’ev, A. R. Kovsh, M. V. Maximov, V. M. Ustinov, B. V. Volovik, A. E. Zhukov, Zh. I. Alferov, G. E. Cirlin, A. O. Golubok, S. A. Masalov, V. N. Petrov, N. N. Ledentsov, R. Heitz, M. Grundmann, D. Bimberg, I. P. Soshnikov, P. Werner, and U. Gösele, in Proceedings of the 24th International Conference in Physics of Semiconductors, Jerusalem, 1998 (World Scientific, Singapore, 1999) [in press].
A. Yu. Egorov, A. R. Kovsh, V. M. Ustinov, A. E. Zhukov, M. V. Maksimov, G. E. Cirlin, N. N. Ledentsov, D. Bimberg, P. Werner, and Zh. I. Alferov, J. Cryst. Growth (1999) [in press].
J. Tersoff, C. Teichert, and M. G. Lagally, Phys. Rev. Lett. 76, 1675 (1996).
A. Ishisaka and Y. Shiraki, J. Electrochem. Soc. 133, 666 (1986).
V. A. Ioshkin, A. A. Orlikovskii, S. R. Oktyabr’skii, A. V. Kvit, and E. Yu. Dovydenko, Proceedings FTIAN (Nauka, Moscow, 1994), Vol. 8, p. 58.
G. M. Gur’yanov, V. N. Demidov, N. N. Korneeva, V. N. Petrov, Yu. V. Samsonenko, and G. E. Tsyrlin, Zh. Tekh. Fiz. 67, 111 (1997) [Tech. Phys. 67, 956 (1997)].
A. O. Golubok, S. A. Masalov, N. V. Ponomareva, V. N. Petrov, S. Ya. Tipisev, and G. E. Tsyrlin, Surfaces: X-Ray, Synchrotron, and Neutron Investigations, Vol. 2, 70 (1998).
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Fiz. Tekh. Poluprovodn. 33, 1158–1163 (October 1999)
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Tsirlin, G.É., Petrov, V.N., Polyakov, N.K. et al. Distinctive features of molecular-beam epitaxial growth of silicon on Si (100) surfaces in the presence of arsenic. Semiconductors 33, 1054–1058 (1999). https://doi.org/10.1134/1.1187863
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DOI: https://doi.org/10.1134/1.1187863