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Ion implantation

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Abstract

Ion implantation has proved an elegant and successful technique, and in the manufacture of silicon devices, is now being extended both for research and practical applications in other materials, such as metals.

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References

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Authors and Affiliations

  1. Atomic Energy Research Establishment, Harwell, Oxfordshire, OX11 0RA, UK

    G. Dearnaley

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  1. G. Dearnaley
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Dearnaley, G. Ion implantation. Nature 256, 701–705 (1975). https://doi.org/10.1038/256701a0

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  • DOI: https://doi.org/10.1038/256701a0

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