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Damping of the Growth of Titanium Oxide Nanolayer Formed by Molecular Layer Deposition Technique on Oxidized Silicon Surface

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Abstract

Ellipsometric data on titanium oxide nanolayers synthesized by molecular layer deposition technique on oxidized Si(100) surface are discussed.

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Authors and Affiliations

  1. St. Petersburg State Technological Institute, St. Petersburg, Russia

    V. P. Dorofeev, A. A. Malygin & S. I. Kol'tsov

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  1. V. P. Dorofeev
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  2. A. A. Malygin
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  3. S. I. Kol'tsov
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Dorofeev, V.P., Malygin, A.A. & Kol'tsov, S.I. Damping of the Growth of Titanium Oxide Nanolayer Formed by Molecular Layer Deposition Technique on Oxidized Silicon Surface. Russian Journal of Applied Chemistry 77, 1061–1065 (2004). https://doi.org/10.1023/B:RJAC.0000044148.15001.48

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