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Effect of Hot Carriers and Ionizing Radiation on the Spectrum of Interface States in MOS Transistors

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Abstract

It was established experimentally that the degradation of MOS transistors under the action of hot carriers and ionizing radiation takes place in various ways despite the formal similarity of the degradation processes.

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REFERENCES

  1. Ionizing Radiation Effects in MOS Devices and Circuits,Ma, T.-P. and Dressendorfer, P.V., Eds., New York: Wiley-Interscience, 1989.

    Google Scholar 

  2. McBrayer, J.D., Fleetwood, D.M., Pastorek, R.A., et al., IEEE Trans. Nucl. Sci., 1985, vol. 32(6), p. 3935.

    Google Scholar 

  3. McWhorter, P.J. and Winokur, P.S., Appl. Phys. Lett.,1986, vol. 48, p. 133.

    Google Scholar 

  4. Aronzon, B.A., Bakaushin, D.A., Vedeneev, A.S., et al., Fiz. Tekh. Poluprovod., 1997, vol. 31(12), p. 1461.

    Google Scholar 

  5. Sze, S.M., Physics of Semiconductor Devices, New York: Wiley, 1981. Translated under the title Fizika poluprovodnikovykh priborov, Moscow: Mir, 1984.

    Google Scholar 

  6. Winokur, P.S., Schwank, J.R., McWhorter, P.J., et al., IEEE Trans. Nucl. Sci., 1984, vol. 31(6), p. 1453.

    Google Scholar 

  7. Vandamme, L.K.J. and Li, X., Microelectron. Reliab.,1998, vol. 38(1), p. 29.

    Google Scholar 

  8. Belyakov, V.V., Zebrev, G.I., Shvetzov-Shilovsky, I.N., et al., Abstracts of Papers, RADECS-97, Cannes, 1997, p. 159.

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Lomakin, S.S., Zebrev, G.I. Effect of Hot Carriers and Ionizing Radiation on the Spectrum of Interface States in MOS Transistors. Instruments and Experimental Techniques 43, 810–814 (2000). https://doi.org/10.1023/A:1026688421816

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  • DOI: https://doi.org/10.1023/A:1026688421816

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