Abstract
We present measurements of conductance noise in undoped a-Si : H and a-SiGe : H thin films in both a transverse and coplanar electrode geometry. For a-Si : H with coplanar electrodes, the noise spectrum is not a pure f −α power law but consists of two linear regions with different slope parameters α. The spectral shape and its temperature dependence are similar for all samples, regardless of the growth technique. Adding Ge results in qualitatively similar spectra; however, α at high frequencies and the temperature dependence are altered. For both a-Si : H and a-SiGe : H with transverse electrodes, the noise spectra are pure f −α power laws, and α decreases with the Ge content.
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References
J. C. Anderson, Philos. Mag. B 48 (1983) 31.
A. D'Amico, G. Fortunato and C. M. Van Vliet, Solid-State Electron. 28 (1985) 837.
C. Parman and J. Kakalios, Phys. Rev. Lett. 67 (1991) 2529.
C. E. Parman, N. E. Israeloff and J. Kakalios, Phys. Rev. B 47 (1993) 12578.
R. E. Johanson, D. Scansen and S. O. Kasap, Philos. Mag. B 73 (1996) 707.
G. M. Khera and J. Kakalios, Phys. Rev. B 56 (1997) 1918.
F. Z. Bathaei and J. C. Anderson, Philos. Mag. B 55 (1987) 87.
M. Baciocchi, A. D'Amico and C. M. Van Vliet, Solid-State Electron. 34 (1991) 1439.
P. A. W. E. Verleg and J. I. Dijkhuis, Phys. Rev. B 58 (1998) 3904.
R. E. Johanson, M. GÜnes and S. O. Kasap, J. Non-Cryst. Solids 266–269 (2000) 242.
G. M. Khera, J. Kakalios, Q. Wang and E. Iwaniczko, Mater. Res. Soc. Symp. Proc. 420 (1996) 641.
M. GÜnes, R. E. Johanson and S. O. Kasap, Phys. Rev. B 60 (1999) 1477.
M. GÜnes, R. E. Johanson and S. O. Kasap, J. Non-Cryst. Solids 266–269 (2000) 304.
M. GÜnes, R. E. Johanson and S. O. Kasap, J. Yang, S. Guha. ibid. 299–302 (2002) 425.
R. E. Johanson, M. GÜnes and S. O. Kasap, IEE Proc.-Circuits Devices Syst. 149 (2002) 68.
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Kasap, S.O., Günes, M., Johanson, R.E. et al. Conductance fluctuations in a-Si : H: effects of alloying and device structure. Journal of Materials Science: Materials in Electronics 14, 693–696 (2003). https://doi.org/10.1023/A:1026127020267
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DOI: https://doi.org/10.1023/A:1026127020267