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Sulfur Concentration in Nanoporous Alumina Membrane

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Abstract

Nanoporous alumina membrane prepared by anodic oxidation using sulfuric acid electrolyte was subjected to TG-DTA and X-ray Photoelectron Spectroscopy (XPS or ESCA) to further study the distribution of sulfur. In XPS study, Ar+ ion bombardment was performed on the sample to etch the surface at a rate of 3 nm min-1. As a result, sulfur was found to be concentrated within a depth of 3nm from the surface. The S content of the surface was found to be 2.7±0.5 wt%, and that at a depth of ca. 3 nm and ca. 10 nm was found to be as low as about 0.6±0.11 wt% (5.37±1.0 wt%→ 1.26±0.2wt% SO2). In TG-DTA, the mass loss of 7.3% was in fair agreement with that calculated on XPS results (7.1±1.2%).

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Authors and Affiliations

  1. North Shore College of SONY Institute, Atsugi Kanagawa, 243-8501, Japan

    R. Ozao

  2. Tokyo Metropolitan University, 1-1 Minami-Osawa Hachioji, Tokyo, 192-0397, Japan

    H. Yoshida

  3. Japan Fine Ceramics Center, 4-1 Rokuno 2-chome, Atsuta Nagoya, Aichi, 456-8587, Japan

    T. Inada

  4. North Shore College of SONY Institute Atsugi, Kanagawa, 243-8501, Japan

    M. Ochiai

Authors
  1. R. Ozao
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  2. H. Yoshida
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  3. T. Inada
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  4. M. Ochiai
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Correspondence to R. Ozao.

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Ozao, R., Yoshida, H., Inada, T. et al. Sulfur Concentration in Nanoporous Alumina Membrane. Journal of Thermal Analysis and Calorimetry 72, 113–118 (2003). https://doi.org/10.1023/A:1023959401129

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  • DOI: https://doi.org/10.1023/A:1023959401129

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