Abstract
The contact electric resistance (CER) of polished copper specimens in 0.003 to 1 N perchloric, sulfuric, and hydrochloric acid solutions and their mixtures is studied. The CER of copper in perchloric acid is shown to substantially exceed that in hydrochloric and sulfuric acids. Small sulfate and chloride additives to perchloric acid solutions prevent the adsorption and reduction of perchlorate ions. A conclusion on the reduction of perchlorate ions on copper is made and a supposition that the high CER values of copper in perchlorate solutions are determined by the adsorption of oxoions, which are intermediate products of the perchlorate reduction, is put forward. A relation between the adsorption of oxoions on copper, silver, platinum, and gold and their electrocatalytic activity is considered.
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Marichev, V.A. Peculiarities of the Contact Electric Resistance of Copper in Perchloric Acid Solutions. Protection of Metals 38, 544–553 (2002). https://doi.org/10.1023/A:1021261702971
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DOI: https://doi.org/10.1023/A:1021261702971