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Effect of film thickness on preferred growth of TiN films during filtered arc deposition

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Journal of Materials Science Letters

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Authors and Affiliations

  1. Ion Beam Laboratory, Shanghai Institute of Metallurgy, Chinese Academy of Sciences, Shanghai, 200050, People‘s Republic of China

    J. P. ZHAO, X. WANG, Z. Y. CHEN, S. Q. YANG, T. S. SHI & X. LIU

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  1. J. P. ZHAO
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  2. X. WANG
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  3. Z. Y. CHEN
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  4. S. Q. YANG
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  5. T. S. SHI
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  6. X. LIU
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ZHAO, J.P., WANG, X., CHEN, Z.Y. et al. Effect of film thickness on preferred growth of TiN films during filtered arc deposition. Journal of Materials Science Letters 16, 974–976 (1997). https://doi.org/10.1023/A:1018529314358

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