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Preparation of silicon oxide films by ultraviolet-assisted rf plasma-enhanced chemical vapour deposition

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Journal of Materials Science Letters

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Authors and Affiliations

  1. Department of Materials Processing Engineering, Nagoya University, Chikusa, Nagoya, 464- 01, Japan

    A. HOZUMI, N. SUGIMOTO, H. SEKOGUCHI & O. TAKAI

Authors
  1. A. HOZUMI
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  2. N. SUGIMOTO
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  3. H. SEKOGUCHI
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  4. O. TAKAI
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HOZUMI, A., SUGIMOTO, N., SEKOGUCHI, H. et al. Preparation of silicon oxide films by ultraviolet-assisted rf plasma-enhanced chemical vapour deposition. Journal of Materials Science Letters 16, 860–862 (1997). https://doi.org/10.1023/A:1018507314842

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