Study of BCN compounds prepared by the chemical vapor deposition with dimethylamineborane

Abstract

B-C-N films were synthesized by using the chemical vapor deposition in which the starting material dimethylamineborane was transported onto a substrate with nitrogen gas, and analyzed with secondary electron microscopy, Raman scattering, infrared spectroscopy, x-ray photoelectron spectroscopy, transmission electron microscopy, electron diffraction, x-ray diffraction, and ultraviolet-visible-rays absorption spectroscopy. Effects of substrate temperature and deposition pressure on the solid-solutions of B-C-N films were investigated by changing substrate temperature between 700 and 1000 °C under deposition pressure between 100 and 760 Torr. It was found that a mixture of microcrystal glassy carbon and turbostratic-BN both with an apparent crystal size of about 10 Å was deposited under the atmospheric pressure at 1000 °C. In deposition where the pressure was reduced from the atmospheric pressure to 600 Torr, BN gradually lost the stoichiometric compositions to form a mixed structure of BNx (x < 1) and glassy carbon. In deposition where the pressure was lowered than 600 Torr, BNxCy : H (x,y < 1) of which dangling bonds wereterminated with hydrogen was produced as a result of further decrease of the BNx nitriding rate and then substitution of carbon for nitrogen. This BNxCy : H (x,y < 1) showed character close to amorphous material and the composition ratio varied continuously for the deposition pressure change.