Skip to main content
Log in

Self-Consistent Modelling of Plasma Sheath Formation: I. Sheath Dynamics in Electropositive Plasma

  • Published:
Czechoslovak Journal of Physics Aims and scope

    We’re sorry, something doesn't seem to be working properly.

    Please try refreshing the page. If that doesn't work, please contact support so we can address the problem.

Abstract

A one-dimensional self-consistent particle model for a low-pressure discharge in an electropositive gas near the planar electrode was developed. The model is based on a deterministic particle-in-cell technique with scattering events treated stochastically. The data for simulation were taken from the argon glow discharge. The purpose of the present work was to clarify the role of different electron and ion mobilities in low-temperature plasma on the dynamics of sheath formation. Another task was to suggest sophisticated algorithms, which can be used in more complex computer experiments studying the sheath dynamics near the realistic substrates in mixtures of gases employed for material processing.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Similar content being viewed by others

References

  1. E. Gogolides and H. H. Sawin: J. Appl. Phys. 72 (1992) 3971.

    Google Scholar 

  2. R. Deutsch and E. Räuchle: Phys. Rev. A 46 (1992) 3442.

    Google Scholar 

  3. I. G. Kouznetsov, A. J. Lichtenberg, and M. A. Lieberman: J. Appl. Phys. 86 (1999) 4142.

    Google Scholar 

  4. A. Amin, H.-S. Kim, S. Yi, J. L. Cooney, and K. E. Lonngren: J. App. Phys. 75 (1994) 4427.

    Google Scholar 

  5. Y. El-Zein, A. Amin, C. Shen, and S. Yi: J. Appl. Phys. 79 (1996) 3853.

    Google Scholar 

  6. A. Kono: J. Phys. D: Appl. Phys. 32 (1999) 1357.

    Google Scholar 

  7. P. Vitello: Jpn. J. Appl. Phys. 38 (1999) 4283.

    Google Scholar 

  8. R. N. Franklin and J. Snell: J. Phys. D: Appl. Phys. 33 (2000) 2019.

    Google Scholar 

  9. R. Hrach and V. Hrachová: Vacuum 60 (2001) 229.

    Google Scholar 

  10. P. Chabert and T. E. Sheridan: J. Phys. D: Appl. Phys. 33 (2000) 1854.

    Google Scholar 

  11. D. Trunec, P. Španěl, and D. Smith: Contrib. Plasma Phys. 35 (1995) 203.

    Google Scholar 

  12. A. Bogaerts, M. van Straaten, and R. Gijbels: Spectrochim. Acta B 50 (1995) 179.

    Google Scholar 

  13. C. K. Birdsall and A. B. Langdon: Plasma Physics via Computer Simulation. Adam Hilger, Bristol, 1991.

    Google Scholar 

  14. R. Hrach: Czech. J. Phys. 49 (1999) 155.

    Google Scholar 

  15. M. Vicher and M. Entlicher: Czech. J. Phys. 50 (2000), Suppl. S3, 477.

  16. S. C. Brown: Basic Data of Plasma Physics: The Fundamental Data on Electrical Discharges in Gases. AIP Press, New York 1994.

    Google Scholar 

  17. I. H. Hutchinson: Principles of Plasma Diagnostics. Cambridge University Press, Cambridge, 1990.

    Google Scholar 

Download references

Author information

Authors and Affiliations

Authors

Rights and permissions

Reprints and permissions

About this article

Cite this article

Hrach, R., Vicher, M. Self-Consistent Modelling of Plasma Sheath Formation: I. Sheath Dynamics in Electropositive Plasma. Czechoslovak Journal of Physics 51, 557–566 (2001). https://doi.org/10.1023/A:1017500418912

Download citation

  • Issue Date:

  • DOI: https://doi.org/10.1023/A:1017500418912

Keywords

Navigation