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Deposition of Films Based on Americium Isotopes by Vapor-Phase Thermal Decomposition of β-Diketonates and Their Adducts with Neutral Ligands

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Abstract

Deposition of 243Am-based films by vapor-phase thermal decomposition of the americium hexafluoroacetylacetonate adduct Am(HFA)3·2TBP was studied. Films containing from fractions of microgram to several tens of micrograms of 243Am are deposited on iron, stainless steel, aluminum, and copper supports in a forevacuum (∼10- 2 mm Hg) at 340-400°C. The highest yields of 243Am deposition (∼75-85%) were obtained on iron and steel supports. Americium is presumably deposited in the form of AmF3.

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Authors and Affiliations

  1. Russian Federal Nuclear Center, Russian Research Institute of Experimental Physics, Sarov, Nizhni Novgorod oblast, Russia

    L. D. Danilin, N. P. Pilipenko, M. Yu. Maksimov & A. E. Trikanov

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  1. L. D. Danilin
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  2. N. P. Pilipenko
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  3. M. Yu. Maksimov
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  4. A. E. Trikanov
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Danilin, L.D., Pilipenko, N.P., Maksimov, M.Y. et al. Deposition of Films Based on Americium Isotopes by Vapor-Phase Thermal Decomposition of β-Diketonates and Their Adducts with Neutral Ligands. Radiochemistry 44, 9–12 (2002). https://doi.org/10.1023/A:1014810814680

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