Abstract
Pb(Mg1/3Nb2/3)0.97Ti0.03O3 (PMNT) polycrystalline thin films were deposited on Titanium Nitride electrode at different temperatures by laser ablation, using a wavelength of 248 nm. The morphology of the films was analyzed by scanning electron microscopy (SEM). The nature of the ferroelectric layer-electrode interface is studied by transmission electron microscopy (TEM) as well as the effect of its characteristics in the performance of the multilayer system. The influence of the annealing temperature on the dielectric properties was studied by hysteresis and fatigue measurements.
Similar content being viewed by others
References
G.A. Smolensky, J. Physical Soc. of Japan, 28, 26 (1970).
S.L. Swartz, T.R. Shrout, W.A. Schultze, and L.E. Cross, J. Amer. Ceram. Soc., 67, 311 (1984).
T.R. Shrout and J. Fielding, Ultrasonic Symposium, 711 (1990).
S.W. Choi, T.R. Shrout, S.J. Jang and A.S. Bhalla, Ferroelectrics, 29, 100 (1989).
P.K. Larsen, R. Cuppens, and G.A.C.M. Spiering, Ferroelectrics, 128, 265 (1992).
M.J. Shyu, T.J. Hong, T.J. Yang, and T.B. Wu, Jpn. J. Appl. Phys., 34(7A), (1995).
W. Wang, J.H. Booske, H.L. Liu, S.S. Gearhart, and J.L. Shohet, J. Mater. Res., 13(3), (1998).
K. Holloway, P.M. Fryer, C. Cabral, Jr., J.M.E. Harper, P.J. Bailey, and K.H. Kellerher, J. Apply. Phys., 71, 543 (1992).
N. Mattoso, C. Achete, and F.L. Freire, Thin Solid Films, 220, 184 (1992).
A. Fundora, A. Vázquez, J. Portelles, F. Calderó n, J.M. Siqueiros, J. Non-Cryst. Sol., 235, 567 (1998).
X. Dai, Z. Xu, D. Viehland, J. Appl. Phys., 79(2), 1021 (1995).
L.E. Cross, Ferroelectrics, 76, 241 (1987).
O. Auciello, L. Mantese, J. Duarte, X. Chen, S.H. Rou, A.I. Kingon, A.F. Schreiner, and A.R. Krauss, J. Appl. Phys., 73(10), 5197 (1993).
M. Wittmer, J. Noser, and H. Melchior, J. Appl. Phys., 52(11), 6659 (1981).
J-P Maria, W. Hackenberger, and S. Trolier-MacKinstry, J. Appl Phys., 84(9), 1998.
W.L.Warren, D. Dimos, B.A. Tuttle, G.E. Pike, R.W. Schwartz, and P.J. Clews, J. Appl. Phys., 77(12), 6695 (1995).
Seshu B. Desu, in K. Yoo, Integrated Ferroelectrics., 3, 365 (1993).
I.K. Yoo and S.B. Desu, J. Mat's. Sci. and Eng., B 13, 319 (1992).
I.K. Yoo and S.B. Desu, MRS Proc., 243, 323, 329 (1992).
I.K. Yoo and S.B. Desu, Phys. Status Solidi, A133, 565 (1992).
T.S. Kim, D.J. Kim, J.K. Lee, and H.J. Jung, J. Mater. Res., 13(12) (1998).
K. Yoo, S.B. Desu, and J. Xing, MRS Symp. Proc., 310, 165 (1993).
A.I. Kingon, O. Auciello, M.S. Ameen, S.H. Rou, and A.R. Kraus, Appl. Phys. Lett., 55, 301 (1989).
W.Y. Pan, C.F. Yan, and B.A. Tuttle, Ceram. Trans., 25, 385 (1992).
O.Y. Jiang, E.C. Subbarao, and L.E. Cross, J. Appl. Phys., 75, 7433, (1994).
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Fundora, A., Martínez, E., Amorín, H. et al. Pb(Mg1/3Nb2/3)0.97Ti0.03O3 Ferroelectric Thin Films, Deposited by Laser Ablation on TiN Bottom Electrodes. Journal of Electroceramics 6, 21–25 (2001). https://doi.org/10.1023/A:1011465502307
Issue Date:
DOI: https://doi.org/10.1023/A:1011465502307