Abstract
Processing thin films for advanced applications, for instance in electronics and optoelectronics, involves several steps starting from precursor synthesis and ending up with the devices. Especially when optimizing the first steps of this chain of processes, thermoanalytical techniques play an important role. The review will focus on the main chemical deposition methods (CVD, ALE, spray pyrolysis, sol-gel) giving selected examples of problem-solving by thermal analysis. The techniques discussed are TG, DTA/DSC, EGA and their combinations. High-temperature X-ray diffraction (HTXRD) is also a powerful tool for in situ studies of thin films. The examples are taken from solar cell, superconductor and flat panel electroluminescent display technologies.
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References
H. Le Chatelier, Bull. Soc. Fr. Minér., 10 (1887) 204
K. Honda, Sci. Rep. Tohôku Univ., 4 (1915) 97.
M. Leskelä, T. Leskelä and L. Niinistö, J. Thermal Anal., 40 (1993) 1077.
P. K. Gallagher, J. Therm. Anal., 38 (1992) 17.
L. Niinistö and M. Karppinen, J. Thermal Anal., 35 (1989) 319.
M. Karppinen, A. Fukuoka, L. Niinistö and H. Yamauchi, Supercond. Sci. Technol., 8 (1995) 1.
M. Karppinen, L. Niinistö and H. Yamauchi, J. Thermal Anal., 48 (1997) 1123.
L. Niinistö, Thermal Analysis, in: Analytical Chemistry, edited by R. Kellner, J.-M. Mermet, M. Otto, H.M. Widmer, Wiley-VCH, Weinheim 1998, pp. 339–359.
M. Yoshimura, J. Mater. Res., 13 (1998) 796.
M. L. Hitchman and K. F. Jensen (Eds.), Chemical Vapor Deposition, Principles and Applications, Academic Press, London 1993.
T. Suntola, In: Handbook of Crystal Growth, vol. 3, edited by D. T. J. Hurle, Elsevier, Amsterdam 1994, pp. 601–663.
L. Niinistö, Current Opinion in Sold State and Materials Science, 3 (1998) 147.
P. K. Gallagher, Thermoanalytical Methods, Ch. 7 in R. W. Cahn, P. Haasen, E. J. Krämer, (Eds.), Materials Science and Technology, A Comprehensive Treatment, Vol. 2A, VCH Publishers Inc., Weinheim 1992.
V. Balek, J. Fusek, O. Kriz, M. Leskelä, L. Niinistö, E. Nykänen. J. Rantanen and P. Soininen, J. Mater. Res., 9 (1994) 119.
Y. Sawada and M. Suzuki, Thermochim. Acta, 254 (1995) 261.
L. Niinistö, Ann. Chim. (Rome), 87 (1997) 221.
M. Tiitta and L. Niinistö, Chem. Vap. Deposition, 3 (1997) 167.
T. Leskelä, K. Vasama, G. Härkönen, P. Sarkio and M. Lounasmaa, Adv. Mater. Opt. Electr., 6 (1996) 169.
M. Leskelä, L. Niinistö, E. Nykänen, P. Soininen and M. Tiitta, Thermochim. Acta, 175 (1991) 91.
M. Tiitta, M. Leskelä, E. Nykänen, P. Soininen and L. Niinistö, Thermochim. Acta, 256 (1995) 47.
L. Hiltunen, M. Leskelä, M. Mäkelä and L. Niinistö, Acta Chem. Scand., Ser. A 41 (1987) 548.
A. Kareiva, M. Karppinen and L. Niinistö, J. Mater. Chem., 4 (1994) 1267.
M. Karppinen, A. Kareiva, J. Lindén, M. Lippmaa and L. Niinistö, J. Alloys Comp., 225 (1995) 586.
A. Kareiva, I. Bryntse, M. Karppinen and L. Niinistö, J. Solid State Chem., 121 (1996) 356.
M. Leskelä, H. Mölsä and L. Niinistö, Supercond. Sci. Technol., 6 (1993) 627.
B. J. Hinds, R. J. McNeeley, D. B. Studebaker, T. J. Marks, T. P. Hogan, J. L. Schindler, C. R. Kannewurf, X. F. Zhang and D. J. Miller, J. Mater. Res., 12 (1997) 1214.
W. Fan and L. Niinistö, Mater. Res. Bull., 29 (1994) 451.
M. Karppinen, L. Niinistö and M. Véber, Acta Chem. Scand., 46 (1992) 255.
T. Leskelä, M. Lippmaa, L. Niinistö and P. Soininen, Thermochim. Acta, 214 (1993) 9.
M. Krunks, J. Madarász, L. Hiltunen, R. Mannonen, E. Mellikov and L. Niinistö, Acta Chem. Scand., 51 (1997) 294.
M. Krunks, T. Leskelä, R. Mannonen and L. Niinistö, J. Therm. Anal. Cal., 53 (1998) 355.
M. Krunks, T. Leskelä, I. Mutikamen and L. Niinistö, J. Therm. Anal. Cal., in press.
J. Madarász, T. Leskelä, J. Rautanen and L. Niinistö, J. Mater. Chem., 6 (1996) 781.
T Arii, A. Kishi, Y. Kobayashi, Thermochim. Acta, 325 (1999) 151.
J. Kristóf, J. Mihály, S. Daolio, A. De Battisti, L. Nanni and C. Piccirillo, J. Electroanal. Chem., 434 (1997) 99.
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Niinistö, L. From Precursors to Thin Films - Thermoanalytical Techniques in the Thin Film Technology. Journal of Thermal Analysis and Calorimetry 56, 7–15 (1999). https://doi.org/10.1023/A:1010154818649
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DOI: https://doi.org/10.1023/A:1010154818649