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Measurements of thermal diffusivity of boron-silicon film-on-glass structure using phase detection method of photothermal deflection spectroscopy

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Abstract

The phase detection method of photothermal deflection spectroscopy in the transverse configuration was used to measure the overall thermal diffusivity of silicon-boron (Si-B) alloy film on Corning 7059 glass substrate. Results were attained by observing the phase of deflection of the probe beam when it scanned above the film surface relative to the pump beam. Measurements were repeated for different modulation frequencies of the pump beam. Furthermore, both bouncing and skimming configurations were used. The effect of varying the distance between the probe beam and film surface was investigated.

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Authors and Affiliations

  1. State Key Laboratory of Modern Optical Instrumentation, Zhejiang University, People's Republic of China

    B. X. Shi

  2. Department of Applied Physics and Materials Research Center, The Hong Kong Polytechnic University, Hung Hom, Kowloon, Hong Kong, People's Republic of China

    C. W. Ong & K. L. Tam

Authors
  1. B. X. Shi
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  2. C. W. Ong
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  3. K. L. Tam
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Shi, B.X., Ong, C.W. & Tam, K.L. Measurements of thermal diffusivity of boron-silicon film-on-glass structure using phase detection method of photothermal deflection spectroscopy. Journal of Materials Science 34, 5169–5173 (1999). https://doi.org/10.1023/A:1004751627438

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  • DOI: https://doi.org/10.1023/A:1004751627438

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