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Constitution and Crystallography of Thin Thermal-Oxide Layers on varepsilon -Fe2N1-x: A HREM Investigation

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Abstract

Oxide layers formed on varepsilon -Fe2N1-x wereinvestigated with X-ray photoelectron spectroscopy, X-ray diffraction, andin particular with high-resolution transmission electron microscopy. Priorto oxidation, the varepsilon -Fe2N1-x substrates wereeither exposed to air at room temperature, or subjected to asputter-cleaning pretreatment, or to a sputter cleaning with an additionalannealing pretreatment. The samples were oxidized at 400 or 573 K in pureO2 at 8.0x10-2 Pa or at 105Pa. All oxide films contained magnetite (ɛ -Fe2N1-x)as a major constituent. On samples that were sputter-cleaned and annealedprior to oxidation as well as on the air-exposed sample, wüstite,(Fe1-δO) was observed between the Fe3O4and ɛ -Fe2N1-x. On the basis of HREM, thiswüstite phase, which on α-Fe does not develop at temperaturesbelow 843 K, was concluded to have a preferred crystallographic orientationwith respect to the supporting ɛ -Fe2N1-x grains. Nospecific orientation relation was found between Fe3O4 andɛ -Fe2N1-x. The implications of the developmentof Fe1-δO for the evolution of the oxide film arediscussed.

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Graat, P.C.J., Zandbergen, H.W., Somers, M.A.J. et al. Constitution and Crystallography of Thin Thermal-Oxide Layers on varepsilon -Fe2N1-x: A HREM Investigation. Oxidation of Metals 53, 221–240 (2000). https://doi.org/10.1023/A:1004547100725

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  • DOI: https://doi.org/10.1023/A:1004547100725

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