Abstract
In this paper we formulate and analyse moving-boundary problems arising from the dissociative model for impurity diffusion in a semiconductor. We consider one-dimensional surface-source and implant problems and two-dimensional diffusion under a mask edge. The diffused profiles which result exhibit a number of novel features.
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King, J., Meere, M. Some moving-boundary problems arising from a model for solid-state diffusion. Journal of Engineering Mathematics 31, 1–27 (1997). https://doi.org/10.1023/A:1004254724767
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DOI: https://doi.org/10.1023/A:1004254724767