Abstract
CO2 and O2 were employed as reactive gases to fabricate carbon-doped titanium oxide films using DC reactive magnetron sputtering. Microstructure, composition and optical band gap of the films were investigated by X-ray diffraction, X-ray photoelectron spectroscopy, and UV–visible spectrophotometer, respectively. The results showed that carbon-doped titanium monoxide films (C-TiO) with a carbon concentration of 5.8 at.% were obtained in an Ar/CO2 mixed atmosphere. However, carbon-doped rutile and anatase (C-TiO2) with a carbon concentration of about 1.4 at.% were obtained in an Ar/CO2/O2 mixed atmosphere. The optical band gaps of C-TiO and C-TiO2 were about 2.6 and 2.9 eV, respectively. Both of them were narrower than that of pure TiO2 films. Films with narrowed optical band gap energy are promising in promoting their photo-catalytic activity.
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Acknowledgments
This work was supported by the National Natural Science Foundation of China (Nos. 81171462 and 51062002), the Sichuan Youth Science & Technology Foundation for Distinguished Young Scholars (No. 2012JQ0001), and the Fundamental Research Funds for the Central Universities (Nos. SWJTU11CX078 and SWJTU12ZT08).
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Xie, D., Wen, F., Yang, W. et al. Carbon-Doped Titanium Oxide Films by DC Reactive Magnetron Sputtering Using CO2 and O2 as Reactive Gas. Acta Metall. Sin. (Engl. Lett.) 27, 239–244 (2014). https://doi.org/10.1007/s40195-014-0049-z
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DOI: https://doi.org/10.1007/s40195-014-0049-z