Abstract
SrFeOx resistive switching memory devices based on brownmillerite with an oxygen vacancy channel exhibit high durability and fast performance. In particular, a high on/off ratio of > 104 was observed when Nb-doped SrTiO3 was used as the bottom electrode. We studied a SrFeOx/Nb-doped SrTiO3 (111) device with a high on/off ratio, and used in-situ transmission electron microscopy to examine the crystalline structures of the SrFeOx layer in the high and low resistance states. We employed electron energy-loss spectroscopy to determine oxygen redistribution near the interface between the SrFeOx structure and Nb-doped SrTiO3. The resistance increased when oxygen vacancies accumulated at the interface between Nb-doped SrTiO3 and perovskite SrFeO3−δ, and decreased when oxygen ions filled the interface. In contrast, we observed little change in the oxygen concentration at the interface between Nb-doped SrTiO3 and brownmillerite SrFeO3−δ. We show that the resistance of the SrFeOx/Nb-doped SrTiO3 (111) device is mostly concentrated at the interface between the perovskite SrFeO3−δ and Nb-doped SrTiO3, which changes the barrier height.
Graphical Abstract
![](http://media.springernature.com/lw685/springer-static/image/art%3A10.1007%2Fs13391-021-00334-4/MediaObjects/13391_2021_334_Figa_HTML.png)
![](http://media.springernature.com/m312/springer-static/image/art%3A10.1007%2Fs13391-021-00334-4/MediaObjects/13391_2021_334_Fig1_HTML.png)
![](http://media.springernature.com/m312/springer-static/image/art%3A10.1007%2Fs13391-021-00334-4/MediaObjects/13391_2021_334_Fig2_HTML.png)
![](http://media.springernature.com/m312/springer-static/image/art%3A10.1007%2Fs13391-021-00334-4/MediaObjects/13391_2021_334_Fig3_HTML.png)
![](http://media.springernature.com/m312/springer-static/image/art%3A10.1007%2Fs13391-021-00334-4/MediaObjects/13391_2021_334_Fig4_HTML.png)
![](http://media.springernature.com/m312/springer-static/image/art%3A10.1007%2Fs13391-021-00334-4/MediaObjects/13391_2021_334_Fig5_HTML.png)
Similar content being viewed by others
References
Waser, R., Dittmann, R., Staikov, G., Szot, K.: Redox-based resistive switching memories - nanoionic mechanisms, prospects, and challenges. Adv. Mater. (2009). https://doi.org/10.1002/adma.200900375
L., Wang C.-H., Yang J., Wen.: Physical principles and current status of emerging non-volatile solid state memories. Electron. Mater. Lett. 11(4), 505–543 (2015). https://doi.org/10.1007/s13391-015-4431-4
Gupta, V., Kapur, S., Saurabh, S., Grover, A.: Resistive random access memory: a review of device challenges. IETE Tech. Rev. 37, 377 (2019)
Bo, Qu Adnan, Younis Dewei, Chu.: Recent progress in tungsten oxides based memristors and their neuromorphological applications. Electron. Mater. Lett. 12(6), 715–731 (2016). https://doi.org/10.1007/s13391-016-6129-7
Sawa, A.: Resistive switching in transition metal oxides. Mater. Today (2008). https://doi.org/10.1016/s1369-7021(08)70119-6
Zhang, R., Huang, H., Xia, Q., et al.: Role of oxygen vacancies at the TiO2/HfO2 interface in flexible oxide-based resistive switching memory. Adv. Electro. Mater. 5, 1800833 (2019)
Jeong, H.Y., Kim, S.K., Lee, J.Y., Choi, S.Y.: Role of interface reaction on resistive switching of metal/amorphous TiO2/Al RRAM devices. J. Electrochem. Soc. (2011). https://doi.org/10.1149/1.3622295
Choi, S.-j., Kim, K.-H., Yang, W.-y., Lee, H.-I., Cho, S.: The effect of oxide layer vacancies on switching behavior in oxide resistive devices. Electron. Mater. Lett. 10(1), 57–60 (2014). https://doi.org/10.1007/s13391-013-3001-x
Miao, F., Joshua Yang, J., Borghetti, J., Medeiros-Ribeiro, G., Stanley Williams, R.: Observation of two resistance switching modes in TiO2 memristive devices electroformed at low current. Nanotechnology 22, 254007 (2011)
Goux, L., Czarnecki, P., Chen, Y.Y., et al.: Evidences of oxygen-mediated resistive-switching mechanism in TiN\HfO2\Pt cells. Appl. Phys. Lett. (2010). https://doi.org/10.1063/1.3527086
De Stefano, F., Houssa, M., Kittl, J.A., Jurczak, M., Afanas’ev, V.V., Stesmans, A.: Semiconducting-like filament formation in TiN/HfO2/TiN resistive switching random access memories. Appl. Phys.Lett. (2012). https://doi.org/10.1063/1.3696672
Sassine, G., De Barbera, S., Najjari, N., Minvielle, M., Dubourdieu, C., Alibart, F.: Interfacial versus filamentary resistive switching in TiO2 and HfO2 devices. J Vacuum Sci & Technology B Nanotech Microelectron: Mater., Process., Measure., and Phenomena. (2016). https://doi.org/10.1116/1.4940129
Kim, W.-G., Rhee, S.-W.: Effect of the top electrode material on the resistive switching of TiO2 thin film. Microelectron. Eng. 87, 98 (2010)
Choi, S.-J., Yang, W.Y., Kim, K.H., Kyoung, Y.-K, Chung, J.-G., Bae, H.-J., Park, J.-C., Kim, K.-K., Lee, S., Cho, S.: Resistive switching property of copper sulfide and its dependence on electrode. Electron. Mater. Lett. 7(4), 313–317 (2011). https://doi.org/10.1007/s13391-011-0190-z
Jeen, H., Choi, W.S., Freeland, J.W., Ohta, H., Jung, C.U., Lee, H.N.: Topotactic phase transformation of the brownmillerite SrCoO2.5 to the perovskite SrCoO3-delta. Adv. Mater. 25, 3651 (2013)
Nemudry, A., Rudolf, P., Schollhorn, R.: Topotactic electrochemical redox reactions of the defect perovskite SrCoO2.5+x. Chem. Mater. 8, 2232 (1996)
Khare, A., Shin, D., Yoo, T.S., et al.: Topotactic metal-insulator transition in epitaxial SrFeO brownmillerite thin films. Adv Mater (2017). https://doi.org/10.1002/adma.201606566
Auckett, J.E., Lee, W.T., Rule, K.C., Bosak, A., Ling, C.D.: Order, disorder, and dynamics in brownmillerite Sr2Fe2O5. Inorg. Chem. 58, 12317 (2019)
D’Hondt, H., Abakumov, A.M., Hadermann, J., et al.: Tetrahedral chain order in the Sr2Fe2O5 brownmillerite. Chem. Mater. 20, 7188 (2008)
Acharya, S.K., Jo, J., Raveendra, N.V., et al.: Brownmillerite thin films as fast ion conductors for ultimate-performance resistance switching memory. Nanoscale 9, 10502 (2017)
Ferreiro-Vila, E., Blanco-Canosa, S., Lucas-del-Pozo, I., et al.: Room-temperature AFM electric-field-induced topotactic transformation between perovskite and brownmillerite SrFeOx with sub-micrometer spatial resolution. Adv. Funct. Mater.29, 1901984 (2019)
Nallagatla, V.R., Heisig, T., Baeumer, C., et al.: Topotactic phase transition driving memristive behavior. Adv. Mater. (2019). https://doi.org/10.1002/adma.201903391
Kim, H.G., Nallagatla, V.R., Kwon, D.-H., Jung, C.U., Kim, M.: In situ observations of topotactic phase transitions in a ferrite memristor. J. Appl. Phys. (2020). https://doi.org/10.1063/5.0015902
Nallagatla, V.R., Jung, C.U.: Resistive switching behavior in epitaxial brownmillerite SrFeO2.5/Nb:SrTiO3 heterojunction. Appl. Phys. Lett. (2020). https://doi.org/10.1063/5.0015151
Mitra, C., Meyer, T., Lee, H.N., Reboredo, F.A.: Oxygen diffusion pathways in brownmillerite SrCoO2.5: influence of structure and chemical potential. J. Chem. Phys. 141, 084710 (2014)
Pate, C.M., Hart, J.L., Taheri, M.L.: RapidEELS: machine learning for denoising and classification in rapid acquisition electron energy loss spectroscopy. Sci. Rep. 11, 19515 (2021)
Zhu, G.Z., Radtke, G., Botton, G.A.: Bonding and structure of a reconstructed (001) surface of SrTiO3 from TEM. Nature 490, 384 (2012)
Cooper, D., Baeumer, C., Bernier, N., et al.: Anomalous resistance hysteresis in oxide ReRAM: oxygen evolution and reincorporation revealed by in situ TEM. Adv. Mater. (2017). https://doi.org/10.1002/adma.201700212
Park, J., Kwon, D.-H., Park, H., Jung, C.U., Kim, M.: Role of oxygen vacancies in resistive switching in Pt/Nb-doped SrTiO3. Appl Phys Lett (2014). https://doi.org/10.1063/1.4901053
Lee, S., Lee, J.S., Park, J.-B., Koo Kyoung, Y., Lee, M.-J., Won Noh, T.: Anomalous effect due to oxygen vacancy accumulation below the electrode in bipolar resistance switching Pt/Nb:SrTiO3 cells APL. Materials (2014). https://doi.org/10.1063/1.4884215
Hu, Z., Li, Q., Li, M., et al.: Ferroelectric memristor based on Pt/BiFeO3/Nb-doped SrTiO3 heterostructure. Appl. Phys. Lett. (2013). https://doi.org/10.1063/1.4795145
Wang, Z., Nair, H.P., Correa, G.C., et al.: Epitaxial integration and properties of SrRuO3 on silicon. APL Mater (2018). https://doi.org/10.1063/1.5041940
Wang, L., Yang, Z., Wu, J., et al.: Time- and strain-dependent nanoscale structural degradation in phase change epitaxial strontium ferrite films. NPJ Mater Degradat (2020). https://doi.org/10.1038/s41529-020-0120-3
Tung, R.T.: The physics and chemistry of the schottky barrier height. Appl. Phys. Rev. (2014). https://doi.org/10.1063/1.4858400
Matsubayashi, Y., Nomoto, J., Yamaguchi, I., Tsuchiya, T.: Control of the oxygen deficiency and work function of SrFeO3−δ thin films by excimer laser-assisted metal organic decomposition. CrystEngComm (2020). https://doi.org/10.1039/d0ce00442a
Acknowledgements
This research was supported by the Creative Materials Discovery Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Science, ICT and Future Planning (2017M3D1A1040688). C. U. Jung was supported by Hankuk University of Foreign Studies Research Fund of 2021. V. R. Nallagatla was supported through the National Research Foundation of Korea (NRF) grant funded by the Korea government (MSIT) (No. 2020R1A2C2006187). G.-S. Park was supported by the National Research Foundation of Korea (NRF) grants funded by the Ministry of Science, ICT & Future Planning (MSIP) (NRF-2019M3F3A1A02071845). TEM and Cs-corrected STEM, EELS works were acquired using Thermofisher TENCAI F20 and ThemisZ installed at the Research Institute of Advanced Materials (RIAM) in Seoul National University. Part of this study has been performed using facilities at IBS Center for Correlated Electron Systems, Seoul National University.
Author information
Authors and Affiliations
Corresponding authors
Ethics declarations
Conflict of interest
The authors declare that they have no conflict of interest.
Additional information
Publisher's Note
Springer Nature remains neutral with regard to jurisdictional claims in published maps and institutional affiliations.
Rights and permissions
About this article
Cite this article
Kim, H.G., Nallagatla, V.R., Jung, C.U. et al. Understanding the Behavior of Oxygen Vacancies in an SrFeOx/Nb:SrTiO3 Memristor. Electron. Mater. Lett. 18, 168–175 (2022). https://doi.org/10.1007/s13391-021-00334-4
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s13391-021-00334-4