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Performance Evaluation of Rotational-Magnetorheological Glass–Ceramic Polishing (R-MRGP) Process Setups

  • Research Article-Mechanical Engineering
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Abstract

Ultrafine glass–ceramic polishing is very challenging due to structural inconsistencies, chemical inhomogeneity and high stiffness. In the modern optics sectors, glass–ceramics are extensively used. In the present study, two different experimental setups of rotational-magnetorheological glass–ceramic polishing (R-MRGP) process are used to super-finish the complex freeform curved profiles of the glass–ceramic workpiece. After polishing, the performance of both R-MRGP process setups is compared in terms of uniformity in surface roughness, surface reflectance characteristics, surface topographical images and material removal rate (MRR). Further, magnetostatics fluid-flow analysis is performed for both R-MRGP process setups to study the distributions of magnetic flux density (MFD), axial velocity and shear stress along the glass–ceramic profile. This finite element analysis (FEA) helps in recognizing the polishing capability of R-MRGP process setups. In the current study, finishing force analysis is also performed to develop a theoretical model for predicting and comparing the obtained MRR in both R-MRGP process setups. The final outcome demonstrates that the workpiece has an excellent surface quality, with a minimum achieved roughness of 1.91 nm after using the R-MRGP process setup-II. The versatility of the R-MRGP process makes it a viable option for ultra-precision polishing of glass–ceramics.

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Abbreviations

A p :

Normal projected area of working surface (m2)

A :

Magnet vector potential (Tm or Wb/m)

B :

MFD (T) or (Wb/m2)

B (x) :

MFD variation in working gap (x) (T)

Brem :

Remnant magnetic flux (A/m)

D i :

Indentation diameter (m)

D g :

Abrasive particle diameter in (m)

F :

Volumetric body force (N/m3)

F c :

Cutting force (N)

F indentation :

Normal indentation force (N)

F m :

Normal magnetic force (N)

F s :

Shear force (N)

F t :

Tangential force (N)

F cen :

Centrifugal force acting on active abrasive (N)

H :

Magnetic field intensity (A/m)

H BHN :

Brinell hardness number

H 0 :

Saturation magnetic field strength (A/m)

m :

Consistency index

M :

IPs magnetization (A-m2/Kg)

M m :

Mass magnetization (emu/g)

M s :

Saturation magnetization (A/m)

Mmrpf :

MR fluid particle magnetization (A/m)

m ip :

Mass of IPs (kg)

m AP :

Mass of abrasives (kg)

N :

Magnets rotational speed (rpm)

N g :

Amount of active abrasives

p :

Pressure exerted on workpiece profile by MRPF (N/m2)

R a :

Centre-line-average (CLA) surface roughness value (nm)

t :

Depth of indentation (m)

u :

MRPF velocity (m /s)

V :

Volume fraction of MRPF’s elements

μ 0 :

Relative permeability of free space (Wb/A.m)

μ r :

Relative permeability of the permanent magnet

ρ MRP :

MRPF density (g/cm3)

ρ :

MRPF’s elements density (g/cm3)

μ :

Plastic viscosity (Pa.s)

τ y :

Yield stress (kPa)

τ :

Shear stress (kPa)

ϕ :

Volume fraction of IPs

η :

Apparent viscosity (kg/(m.s))

χ :

Mass magnetic susceptibility of IPs (m3/kg)

ω :

Angular velocity (rad/s

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Acknowledgements

We acknowledge the Science & Engineering Research Board (SERB), New Delhi, India, for their financial assistance for project No. EEQ/2017/000597 titled "Fabrication of Prosthetic Im-plants and further Nanofinishing using Magnetic Field Assisted Finishing (MFAF) Process."

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  1. Department of Mechanical Engineering, Indian Institute of Technology, Guwahati, India

    Manjesh Kumar & Manas Das

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  1. Manjesh Kumar
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Correspondence to Manjesh Kumar.

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Kumar, M., Das, M. Performance Evaluation of Rotational-Magnetorheological Glass–Ceramic Polishing (R-MRGP) Process Setups. Arab J Sci Eng 47, 15269–15284 (2022). https://doi.org/10.1007/s13369-021-06504-8

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