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Structural and Optical Properties of V2O5 Thin Films Grown by PLD Technique

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Abstract

α -vanadium pentoxide (α-V2O5) thin films with the orthorhombic crystal structure were successfully grown on Si-substrates using pulsed laser deposition (PLD) technique with varying substrate temperatures. XRD spectra confirm the formation of orthorhombic V2O5 phase which is evident as the strongest peak at ~ 20.38°. The films are apparently crystalline in nature, and the average crystallite size ranges between ~ 200 nm–~ 400 as obtained from Scherrer’s equation. FESEM image shows the films as compact nanostructured type displaying a globular (at 500 °C) or sheath like morphology (at 600 °C and 700 °C). AFM study shows that the average surface roughness of V2O5 films increases with increasing substrate temperature. UV–vis spectroscopy shows that the fundamental absorption edge has shifted to the red side (higher wavelength) with increasing temperature. Optical band gap values (Eg) decrease with increasing deposition temperature (at 700 °C, Eg ~ 2.08 eV).

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Acknowledgements

The authors would like to acknowledge the Researchers Supporting Project number (RSP-2021/373), King Saud University, Riyadh, Saudi Arabia.

Funding

This research is funded by Researchers Supporting Project number (RSP-2021/373), King Saud University, Riyadh, Saudi Arabia.

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Authors and Affiliations

  1. Mechanical Engineering Department, College of Engineering, King Saud University, P.O. Box 800, Al-Riyadh, 11421, Saudi Arabia

    Asiful H. Seikh

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  1. Asiful H. Seikh
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Correspondence to Asiful H. Seikh.

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Seikh, A.H. Structural and Optical Properties of V2O5 Thin Films Grown by PLD Technique. Trans Indian Inst Met 75, 193–198 (2022). https://doi.org/10.1007/s12666-021-02415-2

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