Abstract
In the current study, a comparative approach was followed to explore the effect of two specific forms of Si nanocrystallites structures (Si quantum dots (SiQDs) and horizontally oriented Si nanopillars H_Si nanopillars deposited on etched Si) on the performance of electrically matched impedance pesticides sensor. The aim is to develop effective, simple, and low-cost electrical sensors for the quantitative detection process of (Chlorpyrifos) pesticide. Impedance-matching SiQDs and H_Si nanopillars/etched Si electrical sensors with two front coplanar electrodes configuration were adopted and studied to investigate the optimum structures for sensing pathway. The SiQDs and H_Si nanopillars structures were formed on etched Si substrates by aggressive laser-assisted etching method using two elevated laser power densities of about (300 and 400) mw/cm2 at 15 min irradiation time. The performance of the sensors under low Chlorpyrifos concentrations (1–20 ppm) was investigated at room temperature. The obtained results revealed an extremely high sensitivity 0.91%, very low limit of detection (0.2 ppm) and moderate stability with SiQDs structures daily reduction rate of 6 × 10–3%. An excellent daily stability (4.5 × 103%) of the H_Si nanopillars structures was obtained in addition to moderate sensitivity (0.72%) and (0.8 ppm) limit of detection. These results were attributed to the small SiQDs structures dimensions together with their high surface density. The aggressive laser-assisted etching method showed easy run and unique characteristics of these electrical sensors.
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All authors contributed to the study's conception and design. Material preparation, data collection, and analysis were performed by RBR, AMA, and MSM. The first draft of the manuscript was written by AMA and all authors commented on previous versions of the manuscript. All authors read and approved the final manuscript.
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Rashid, R.B., Alwan, A.M. & Mohammed, M.S. Performance of SiQDs and H_Si nanopillars/etched Si electrical sensor synthesized by aggressive laser-assisted etching method: comparative study. Indian J Phys 97, 2449–2460 (2023). https://doi.org/10.1007/s12648-023-02624-z
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DOI: https://doi.org/10.1007/s12648-023-02624-z