Abstract
The high-temperature X-ray diffraction method showed the presence of two phase states of oxygen in the volume of a single crystal of silicon grown by the Czochralski method: a dissolved (interstitial) state in the composition of “quasimolecules”—SiO2 and a chemically bound (precipitate) state in the composition of silicon dioxide—SiO2; the precipitate state of oxygen in the bulk of silicon is in the form of crystalline SiO2(c), and in the near-surface layer of a single crystal in the amorphous form of SiO2(a). The thermally stimulated transformation of oxygen atoms between dissolved and precipitate states of oxygen in crystalline form in the bulk of a silicon single crystal has been established.
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Acknowledgements
The authors are sincerely grateful to B.S. Yuldashev for constant attention and support at all stages of this scientific research.
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The Fundamental Research Programs of the Uzbekistan Academy of Sciences financially supported this work.
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M.U. Kalanov: Writing-review & editing, I.I. Sadikov: Writing-original draft, A.V. Khugaev: Validation, Data curation, Sh.R.Malikov: Project administration, A.S. Saidov: Funding acquisition. Sh.N. Usmonov: Supervision. D.V.Saparov: carried out the experiment and writing original manuscript.
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Kalanov, M.U., Sadikov, I.I., Khugaev, A.V. et al. Thermally Stimulated Transformation of Oxygen Atoms Between Phase States in a Silicon Single Crystal. Silicon (2024). https://doi.org/10.1007/s12633-024-02985-y
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DOI: https://doi.org/10.1007/s12633-024-02985-y