Abstract
Through the competitive selective growth process between {100}, {110}, and {111} grains during final annealing which is governed by the primary grain size and the surface segregation concentration of sulfur, the sharp {110}<001> annealing texture can be developed in a C-and Al-free Fe-3%Si-0.1%Mn electrical steel. Generally, the selective growth of the {110} grains occurs actively under the low surface segregation concentration of sulfur. In spite of the surface energy disadvantage, the selective growth of a {hkl} grain can however occur, if the {hkl} grain size is larger than the critical grain size linearly proportional to the strip thickness.
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Oh, E.J., Heo, N.H., Kwon, S.K. et al. Mechanism for selective growth in electrical steel. Met. Mater. Int. 24, 216–220 (2018). https://doi.org/10.1007/s12540-017-6883-6
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DOI: https://doi.org/10.1007/s12540-017-6883-6