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All-inorganic transparent Hf0.85Ce0.15O2 ferroelectric thin films with high flexibility and stability

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Abstract

Electronic devices that are transparent and flexible have a wide range of applications in the domains of vital sign parameter monitoring, health management, and so on. Ferroelectric memory is a revolutionary nonvolatile memory that is ideal for data storage and processing in transparent flexible electronic systems. In this study, Ce-doped hafnium oxide ferroelectric thin film is manufactured on mica substrate by the chemical solution deposition with transparent indium tin oxide (ITO) thin films as the bottom electrodes. The transmittance of mica/ITO/Hf0.85Ce0.15O2 thin film is over 80%. The 2Pr of the transparent flexible Hf0.85Ce0.15O2 ferroelectric thin film is increased by about 22.4% and the Ec is reduced by 26.7% compared with those of Hf0.85Ce0.15O2 ferroelectric thin film grown on p+-Si substrate. The transparent flexible Hf0.85Ce0.15O2 ferroelectric thin film can remain keeping good quality when being bent under ±2.5 mm bending radius. Additionally, degradation of polarization, retention, and endurance performance was not obvious even at a bending radius of 5.0 mm after 104 bending cycles. This research provides a new strategy and an important experimental basis for the development and implementation of transparent flexible ferroelectric memories.

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Acknowledgements

This work was supported by the National Natural Science Foundation of China (Nos. 11902285 and 12072307), the Department of Education Project of Hunan Province, China (Nos. 21B0112 and 19A106), the Science and Technology Agency Project of Hunan Province, China (No. 2020JJ5526), the China Postdoctoral Science Foundation (No. 2019TQ0273), and the Outstanding Youth Science Foundation of Hunan Province, China (No. 2021JJ20041).

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  1. Sheng-Tao Mo and Kai-Ming Feng contributed equally to this work.

Authors and Affiliations

  1. School of Materials Science and Engineering, Xiangtan University, Xiangtan, 411105, China

    Sheng-Tao Mo, Kai-Ming Feng, Jing-Lin Pang, Kuo Ouyang, Li-Mei Jiang, Qiong Yang, Biao Zhang & Jie Jiang

  2. Hunan Provincial Key Laboratory of Thin Film Materials and Devices, Xiangtan University, Xiangtan, 411105, China

    Sheng-Tao Mo, Kai-Ming Feng, Jing-Lin Pang, Kuo Ouyang, Li-Mei Jiang, Qiong Yang, Biao Zhang & Jie Jiang

  3. Key Laboratory of Low Dimensional Materials and Application Technology, Ministry of Education, Xiangtan University, Xiangtan, 411105, China

    Sheng-Tao Mo, Kai-Ming Feng, Jing-Lin Pang, Kuo Ouyang, Li-Mei Jiang, Qiong Yang, Biao Zhang & Jie Jiang

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  1. Sheng-Tao Mo
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Correspondence to Qiong Yang, Biao Zhang or Jie Jiang.

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Mo, ST., Feng, KM., Pang, JL. et al. All-inorganic transparent Hf0.85Ce0.15O2 ferroelectric thin films with high flexibility and stability. Nano Res. 16, 5065–5072 (2023). https://doi.org/10.1007/s12274-022-5074-z

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