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Parallel Plate Flow Chamber Device for Evaluation of Cell Retention of Electrospun Zein Fiber Film Under Steady Shear

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Abstract

Shear stress environment is an important factor in the study of vascular tissue engineering. It is a key issue to improve the adhesion ability of endothelial cells in shear stress environment to format a complete monolayer of endothelial cells on the inner surface of the artificial blood vessel. This study uses electrospinning technology to construct a zein film with nano structure to provide basement membrane for cell retention study. Two parallel plate flow chamber devices are designed to simulate the fluid environment of the blood vessel to compare the adhesion ability of EA.hy926 and L929 cells on the fiber film under shear stress. From the data of cell retention, we find that the shear stress in each hole of 6-hole device is much uniform than that of 18-hole device. This optimized 6-hole device can be used to compare the anti-detaching ability of cells between various surfaces.

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Correspondence to Jinye Wang  (王瑾晔).

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the Science and Technology Commission Shanghai Municipality (No. 18490740200), the Shanghai Municipal Education Commission (No. ZXGF082101), and the National Key Research and Development Project (No. 2019YFE0101200)

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Shen, N., Zhang, Y. & Wang, J. Parallel Plate Flow Chamber Device for Evaluation of Cell Retention of Electrospun Zein Fiber Film Under Steady Shear. J. Shanghai Jiaotong Univ. (Sci.) 26, 69–75 (2021). https://doi.org/10.1007/s12204-021-2262-z

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  • DOI: https://doi.org/10.1007/s12204-021-2262-z

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