Abstract
In the current study, the gate overlap on the drain side was investigated from the prospects of both DC and high-frequency behaviour. The key parameters extracted in this work to determine the main performance parameters are subthreshold swing (SS), ambipolar current (\(I_\mathrm{amb})\), ON/OFF current ratio and cut-off frequency. Although the gate overlap on the drain decreases the ambipolar current, it has an adverse effect on the high-frequency performance as the gate-to-drain capacitance increases. This behaviour is observed for increasing overlap length for low-k gate oxide. On the other hand, the ambipolar current does not show a considerable decline when using high-k gate oxide. To obtain a low ambipolar current at lower values of equivalent oxide thickness (EOT), we propose a low-k dielectric spacer above the drain side. The low-k spacer not only decreases the gate-to-drain capacitance but also facilitates the suppression of ambipolarity due to overlap. All simulations carried out in this work are done using the Silvaco TCAD device simulator.
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Acknowledgements
This work is supported by the Center of Excellence in Nanotechnology, Arab Academy for Science and Technology and Maritime Transport (AASTMT), Cairo, Egypt.
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Eliwy, M., Elgamal, M., Shaker, A. et al. Impact of gate-on-drain overlap on the electrical characteristics of TFETs: Role of oxide material and drain spacer. Pramana - J Phys 96, 93 (2022). https://doi.org/10.1007/s12043-022-02341-y
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DOI: https://doi.org/10.1007/s12043-022-02341-y
Keywords
- Double gate tunnel field-effect transistor
- equivalent oxide thickness
- ambipolar conduction
- spacer
- cut-off frequency