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A negative tone lift-off method for small metal holes using PMMA/SiO2 double layer

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Abstract

We propose a novel method to fabricate small apertures in a metal film using polymethyl methacrylate (PMMA). A PMMA/SiO2 double layer is employed to perform a negative tone lift-off with SiO2 as a sacrificial layer. Through this method, we succeeded in making sub-50 nm holes in a metal film using well-established individual fabrication steps. The proposed method will be more reliable and economical compared to the hydrogen silsesquioxane/PMMA bilayer method.

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Acknowledgements

This work was supported by the research fund of Chungnam National University.

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Authors and Affiliations

  1. Department of Physics, Chungnam National University, Daejeon, 34134, Republic of Korea

    J S Baek & D Lee

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  1. J S Baek
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  2. D Lee
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Correspondence to D Lee.

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Baek, J.S., Lee, D. A negative tone lift-off method for small metal holes using PMMA/SiO2 double layer. Bull Mater Sci 44, 275 (2021). https://doi.org/10.1007/s12034-021-02568-2

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  • DOI: https://doi.org/10.1007/s12034-021-02568-2

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