Abstract
\(\hbox {SrTiO}_{3}\) and Bi-doped \(\hbox {SrTiO}_{3}\) films were fabricated with different device structures using the sol–gel method for non-volatile memory applications, and their resistance-switching behaviour, endurance and retention characteristics were investigated. \(\hbox {SrTiO}_{3}\) and \(\hbox {Sr}_{0.92}\hbox {Bi}_{0.08}\hbox {TiO}_{3}\) films grown on Si or Pt have the same phase structure, morphologies and grain size; however, the grain size of the \(\hbox {Sr}_{0.92}\hbox {Bi}_{0.08}\hbox {TiO}_{3}\) films grown on Si is slightly larger than those of the \(\hbox {SrTiO}_{3}\) films grown on Si and the \(\hbox {Sr}_{0.92}\hbox {Bi}_{0.08}\hbox {TiO}_{3}\) films grown on Pt. The \(\hbox {SrTiO}_{3}\) or \(\hbox {Sr}_{0.92}\hbox {Bi}_{0.08}\hbox {TiO}_{3}\) films grown on Si or Pt all exhibit bipolar resistive-switching behaviour and follow the same conductive mechanism; however, the \(\hbox {Ag}/\hbox {Sr}_{0.92}\hbox {Bi}_{0.08}\hbox {TiO}_{3}/\hbox {Si}\) device possesses the highest \(R_{\mathrm{HRS}}{/}R_{\mathrm{LRS}}\) of \(10^{5}\) and the best endurance and retention characteristics. The doping of Bi is conducive to enhance the \(R_{\mathrm{HRS}}{/}R_{\mathrm{LRS}}\) of the \(\hbox {SrTiO}_{3}\) films; meanwhile, the Si substrates help improve the endurance and retention characteristics of the \(\hbox {Sr}_{0.92}\hbox {Bi}_{0.08}\hbox {TiO}_{3}\) films.
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References
Linn E, Rosezin R, Kügeler C and Waser R 2010 Nat. Mater. 9 403
Pan F, Gao S, Chen C, Song C and Zeng F 2014 Mater. Sci. Eng. R-Rep. 83 1
Wei C, Wang H, Xu J, Zhang Y, Zhang X and Yang L 2017 J. Wuhan Univ. Tech. Mater. Sci. Ed. 32 29
Lee M J, Lee C B, Lee D, Lee S R, Chang M, Hur J H et al 2011 Nat. Mater. 10 625
Torrezan A C, Strachan J P, Medeirosribeiro G and Williams R S 2011 Nanotechnology 22 485203
Tang M H, Zeng Z Q, Li J C, Wang Z P, Xu X L, Wang G Y et al 2011 Solid-State Electron. 63 100
Gao S M, Wang H, Xu J W, Yuan C L and Zhang X W 2012 Solid-State Electron. 76 40
Yan Z B, Guo Y Y, Zhang G Q and Liu J M 2011 Adv. Mater. 23 1351
Sun B C, Wang H, Xu J W, Yang L, Zhou S J, Zhang Y P et al 2014 Microelectron. Eng. 113 1
Wang D, Zhao Y, Xu X, Hercule K M, Yan M, An Q et al 2014 Nanoscale 6 8124
Peng H and Wu T 2009 Appl. Phys. Lett. 95 152106
He Y, Dai P, Xu J, Lu Y Q and Wang H 2013 Adv. Mater. Res. 788 159
Tang M H, Wang Z P, Li J C, Zeng Z Q, Xu X L, Wang G Y et al 2011 J. Semicond. Sci. Technol. 26 075019
Ruth M, Tobias M, Regina D and Rainer W 2010 Adv. Mater. 22 4819
Song M Y, Seo Y, Kim Y S, Kim H D, An H M, Park B H et al 2012 Appl. Phys. Express 5 091202
Karczewski J, Riegel B, Gazda M, Jasinski P and Kusz B 2010 J. Electroceramics 24 326
Hashimoto S, Poulsen F W and Mogensen M 2007 J. Alloy. Compd. 439 232
Fu Q X, Mi S B, Wessel E and Tietz F 2008 J. Eur. Ceram. Soc. 28 811
Xiang W, Dong R, Lee D, Oh S, Seong D and Hwang H 2007 Appl. Phys. Lett. 90 052110
Chen X G, Ma X B, Yang Y B, Chen L P, Xiong G C, Lian G J et al 2011 Appl. Phys. Lett. 98 122102
Zhang Y, Shen J X, Wang S L, Shen W, Cui C, Li P G et al 2012 Appl. Phys. A 109 219
Sun J, Jia C H, Li G Q and Zhang W F 2012 Appl. Phys. Lett. 101 133506
Kumar A and Dho J 2013 Curr. Appl. Phys. 13 768
Menke T, Meuffels P, Dittmann R, Szot K and Waser R 2009 J. Appl. Phys. 105 066104
Muenstermann R, Menke T, Dittmann R and Waser R 2010 Adv. Mater. 22 4819
Wojtyniak M, Szot K, Wrzalik R, Rodenbucher C, Roth G and Waser R 2013 J. Appl. Phys. 113 083713
Tang Z, Xiong Y, Tang M, Cheng C, Xu D, Xiao Y et al 2014 Jpn. J. Appl. Phys. 53 035503
Shannon R D 1976 Acta Cryst. A 32 751
Gong C, Dong G, Hu J, Chen Y, Qin M, Yang S et al 2017 J. Mater. Sci.: Mater. Electron. 28 14893
Lee C B, Kang B S, Benayad A, Lee M J, Ahn S E, Kim K H et al 2008 Appl. Phys. Lett. 93 042115
Choi J H, Das S N and Myoung J M 2009 Appl. Phys. Lett. 95 062105
Lv H, Wang M, Wan H, Song Y, Luo W, Zhou P, Tang T et al 2009 Appl. Phys. Lett. 94 213502
Tang M H, Jiang B, Xiao Y G, Zheng Q Z, Wang Z P, Li J C et al 2012 Microelectron. Eng. 93 35
Wang H, Li Z, Xu J, Zhang Y and Yang L 2016 J. Wuhan Univ. Tech. Mater. Sci. Ed. 31 1230
Xie Y W, Sun J R, Wang D J, Liang S and Shen B G 2006 J. Appl. Phys. 100 033704
Yang Y C, Pan F, Liu Q, Liu M and Zeng F 2009 Nano Lett. 9 1636
Ielmini D 2011 IEEE Trans. Electron Devices 58 4309
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This work was financially supported by the Guangxi Natural Science Foundation, China (Grant No. 2015GXNSFAA139253).
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Wang, H., Zhang, W., Xu, J. et al. Resistance-switching properties of Bi-doped \(\hbox {SrTiO}_{3}\) films for non-volatile memory applications with different device structures. Bull Mater Sci 41, 149 (2018). https://doi.org/10.1007/s12034-018-1677-0
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DOI: https://doi.org/10.1007/s12034-018-1677-0