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Investigation of nanometer-scale films using low angle X-ray reflectivity analysis in IPOE

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Abstract

The X-ray low angle reflectivity measurement is used to investigate single and bilayer films to determine the parameters of nanometer-scale structures, three effectual methods are presented by using X-ray reflectivity analysis to provide an accurate estimation of the nanometer film structures. The parameters of tungsten (W) single layer, such as the material density, interface roughness and deposition rate, were obtained easily and speedily. The base metal layer was introduced to measure the profiles of single low Z material film. A 0.3 nm chromium (Cr) film was also studied by low angle reflectivity analysis.

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Authors and Affiliations

  1. Institute of Precision Optical Engineering, Tongji University, Shanghai, 200092, China

    Wang Zhan-shan, Xu Yao, Wang Hong-chang, Zhu Jing-tao, Zhang Zhong, Wang Feng-li & Chen Ling-yan

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  1. Wang Zhan-shan
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  2. Xu Yao
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  3. Wang Hong-chang
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  4. Zhu Jing-tao
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  5. Zhang Zhong
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  6. Wang Feng-li
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  7. Chen Ling-yan
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Additional information

Antrag GZ 398, Ghinesisch-Deutsches Zentrum für Wissenschaftsförderung.

This work was supported by the National Natural Science Foundation of China(10435050,60378021), the National 863-804 Sustentation Fund(2006AA12Z139), the Program for New Century Excellent Talents in University (NCET-04-037), the Royal Society, London (NC/China/16660), and Tongji University scientific fund.

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Wang, Zs., Xu, Y., Wang, Hc. et al. Investigation of nanometer-scale films using low angle X-ray reflectivity analysis in IPOE. Optoelectron. Lett. 3, 88–90 (2007). https://doi.org/10.1007/s11801-007-7016-0

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  • DOI: https://doi.org/10.1007/s11801-007-7016-0

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