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Morphology and structure analyses of SnO2 thin film coated on Al2O3 ultrafine particles by gas phase reaction in fluidized bed

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Journal of Shanghai University (English Edition)

Abstract

Fluidized chemical vapor deposition (FCVD) technology was developed for coating SnO2 thin film on ultrafine Al2O3 particles. Transmission electron microscopy (TEM) and high-resolution electron microscopy (HREM) analyses demonstrated that SnO2 films with different structures were deposited through controlling the coating temperature, reactant concentration, etc.. Nanocrystalline SnO2 film was formed at 572.15K by gas phase reaction of SnCl4 and H2O. Electron probe microanalyser (EPMA) and energy dispersive spectrometer (EDS) analyses indicated that the distribution of nanocrystalline SnO2 over inner and outer part of the Al2O3 agglomerates was homogeneous.

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Authors and Affiliations

  1. School of Chemistry and Chemical Engineering, Shanghai University, 149 Yanchang Road, 200072, Shanghai

    Hua Bin Ph. D. (Asso. Prof.) & Shi Liyi

  2. Institute of Technical Chemistry and Physics, East China University of Science and Technology, China

    Li Chunzhong

Authors
  1. Hua Bin Ph. D.
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  2. Shi Liyi
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  3. Li Chunzhong
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Additional information

Project supported by the National Natural Science Foundation of China (29486011)

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Hua, B., Shi, L. & Li, C. Morphology and structure analyses of SnO2 thin film coated on Al2O3 ultrafine particles by gas phase reaction in fluidized bed. J. of Shanghai Univ. 3, 62–65 (1999). https://doi.org/10.1007/s11741-999-0031-6

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  • DOI: https://doi.org/10.1007/s11741-999-0031-6

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