Abstract
Thin film nitride coatings were deposited on Si (100) substrates by the pulsed laser deposition (PLD) technique. The PLD method is a unique process for depositing high quality thin films with novel microstructure and properties. Boron nitride (BN) films deposited on Si (100) substrates have a higher percentage of c-BN phases when processed in higher nitrogen partial pressure. Titanium nitride films deposited on Si (100) substrates at a higher temperature (600 °C) have better quality crystallinity and higher hardness and Young’s modulus values than films deposited at lower temperatures. Nanoindentation technique was used to measure the mechanical properties of thin films. The film orientation was determined by x-ray diffraction. Atomic force microscopy (AFM) technique was used to understand the growth structure of the films.
This is a preview of subscription content, log in via an institution to check access.
Similar content being viewed by others
References
A. Kumar, U. Ekanayake, D. Kjendal, N. Shu, R.B. Inturi, and J.A. Barnard, Structural and Mechanical Properties of Pulsed Laser Processed Superhard Coatings, Elevated Temperature Coatings: Science and Technology II, TMS, 1996, p 349–360
P.B. Mirkarimi, K.F. McCarthy, D.L. Medlin, W.G. Wolfer,T.A. Friedman, E.J. Klaus, G.F. Cardinale, and D.G. Howitt, On the Role of Ions in the Formation of Cubic Boron Nitride Films by Ion-Assisted Deposition, J. Mater. Res., Vol 9 (No. 11), Nov 1994, p 2925–2938
Z. Song, F. Zhang, Y. Guo, and G. Chen, Deposition of High Quality Cubic Boron Nitride Film on Nickel Substrates, Appl. Phys. Lett., Vol 65 (No. 8), Aug 1994, p 971–973
T. Ichiki, T. Momose, and T. Yoshida, Effects of the Substrate Bias on the Formation of Cubic Boron Nitride by Inductively Coupled Plasma Enhanced Chemical Vapor Deposition, J. Appl. Phys., Vol 75 (No. 3), Feb 1994, p 1330–1334
G. Gagnon, J.L. Brebner, J.F. Currie, G. Beique, C. Gujrathi, and L. Ouellet, Characterization of Reactively Evaporated TiN Layer for Diffusion Barrier Applications, J. Appl. Phys., Vol 75 (No. 3), Feb 1994, p 1565–1570
S. Chatterjee, S. Chandrashekhar, and T.S. Sudarshan, Deposition Processes and Metal Cutting Applications of TiN Coatings, J. Mat. sci., Vol 22,1992, p 3409–3423
D. Wang, X. Wang, G. Yang, X. Liu, Y. Jia, G. Zhou, and G. Li, Phase and Structure of Nanocrystalline TiN Films, J. Appl. Phys., Vol 77 (No. 7), April 1995, p 2945–2951
D.B. Chrisey and G.K. Hubler, Pulsed Laser Deposition of Thin Films, John Wiley & Sons, Inc., 1994
J.T. Cheung and H. Sankur, Growth of Thin Films by Laser-Induced Evaporation, Crit. Rev. Solid State Mater. sci., Vol 15 (No. 1), 1988, p 63–109
A. Kumar and J. Narayan, Pulsed Laser Deposition of Y1Ba2Cu3O7−δ Films on Polycrystalline Metallic Substrates with TiN Buffer Layers, Supercond. sci. Technol, Vol 6,1993, p 662–669
A. Kumar, J. Narayan, and B. Patnaik, Trilayered Heterostructured In-Situ Laser Deposited High Temperature Superconductors, Physica C, Vol 209, 1993, p 421–427
M. Whittling, A. BenDavid, P.J. Martin, and M.V. Swain, Influence of Thickness and Substrate on the Hardness and the Deformation of TiN Films, Surf. Coat. Technol, 1995
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Kumar, A., Chan, H., Ekanayake, U. et al. Laser ablation synthesis and characterization of nitride coatings. J. of Materi Eng and Perform 6, 577–582 (1997). https://doi.org/10.1007/s11665-997-0046-8
Issue Date:
DOI: https://doi.org/10.1007/s11665-997-0046-8